Etch Properties of 193nm Resists

Polymer chemistries for 193nm resists are more or less defined and their lithographic performance is quite good to implement 100nm design rules. In spite of the use of high carbon containing adamantane or norbornene moieties in the polymer design, there exists etch selectivity as well as surface rou...

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Veröffentlicht in:	Journal of photopolymer science and technology 2002-05, Vol.15 (3), p.521
Hauptverfasser:	Padmanaban, Munirathna, Alemy, Eric, Dammel, Ralph, Kim, Woo-Kyu, Kudo, Takanori, Lee, SangHo, Rahman, Dalil, Chen, Wan-Lin, M. Sadjadi, Reza, Livesay, William, Ross, Matthew
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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