Study of Base Additives for Use in a Single Layer 193nm Resist Based Upon Poly(norbornene/maleic anhydride/acrylic acid/tert-butyl Acrylate)

We report on a study of the chemical and lithographic behavior in a 193nm single layer resist of two types of base additives, aminosulfonates opium and tetrabutylammonium carboxylate salts. These additives were examined because of their low potential for undesirable reaction with maleic anhydride or...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2001, Vol.14(3), pp.373-384
Hauptverfasser:	Houlihan, F.M., Person, D., Rushkin, I., Dimov, O., Reichmanis, E., Nalamasu, O.
Format:	Artikel
Sprache:	eng
Schlagworte:	193nm Base additive Photodecompable base
Online-Zugang:	Volltext
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