Cyclic Olefin Resist Polymers and Polymerizations for Improved Etch Resistance

Cyclic Olefin Resist Polymers and Polymerizations for Improved Etch Resistance

This paper will describe the strengths and unique challenges of building 193nm resists from acrylic polymers and cyclic olefin polymers. In particular, cyclic olefin (alternating) copolymer synthesis and properties will be discussed.

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Bibliographische Detailangaben
Veröffentlicht in:Journal of Photopolymer Science and Technology 1999, Vol.12(3), pp.501-507
Hauptverfasser: Allen, R. D., Opitz, J., Ito, H., Wallow, T. I., Casmier, D. V., Larson, C. E., Sooriyakumaran, R., Hofer, D. C., Varanasi, P. R.
Format: Artikel
Sprache:eng
Schlagworte:
alternating polymers
Cyclic olefin polymers
dissolution properties
etch resistance
free radical polymerization
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Beschreibung
Zusammenfassung:This paper will describe the strengths and unique challenges of building 193nm resists from acrylic polymers and cyclic olefin polymers. In particular, cyclic olefin (alternating) copolymer synthesis and properties will be discussed.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.12.501