Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography
The effect of m/p-cresol novolak molecular-weight-distribution (MWD) and dissolution inhibitor structure on resist performance were investigated. A novolak resin richer in p-cresol ratio gave a large dissolution inhibition capability of polymeric dissolution inhibitor, tetrahydropyranyl (THP) protec...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 1998, Vol.11(4), pp.547-552 |
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| container_issue | 4 |
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| container_title | Journal of Photopolymer Science and Technology |
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| creator | Sakamizu, Toshio Arai, Tadasi Katoh, Kohji Uchino, Shou-ichi Murai, Fumio Suzuki, Yasunori Shiraishi, Hiroshi |
| description | The effect of m/p-cresol novolak molecular-weight-distribution (MWD) and dissolution inhibitor structure on resist performance were investigated. A novolak resin richer in p-cresol ratio gave a large dissolution inhibition capability of polymeric dissolution inhibitor, tetrahydropyranyl (THP) protected-polymeric dissolution inhibitor. In particular, a high molecular-weight novolak resin richer in p-cresol ratio was regarded as an effective matrix of a chemical amplification (CA) positive resist. THP protected phenolic compounds with extended backbone structures showed a large dissolution inhibition. The resist with MWD controlled resin and a THP-protected phenolic compound can achieve high resolution patterns (100-nm contact holes ) with high sensitivity (6.0μC/cm2). |
| doi_str_mv | 10.2494/photopolymer.11.547 |
| format | Article |
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A novolak resin richer in p-cresol ratio gave a large dissolution inhibition capability of polymeric dissolution inhibitor, tetrahydropyranyl (THP) protected-polymeric dissolution inhibitor. In particular, a high molecular-weight novolak resin richer in p-cresol ratio was regarded as an effective matrix of a chemical amplification (CA) positive resist. THP protected phenolic compounds with extended backbone structures showed a large dissolution inhibition. 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Photopol. Sci. Technol.</addtitle><description>The effect of m/p-cresol novolak molecular-weight-distribution (MWD) and dissolution inhibitor structure on resist performance were investigated. A novolak resin richer in p-cresol ratio gave a large dissolution inhibition capability of polymeric dissolution inhibitor, tetrahydropyranyl (THP) protected-polymeric dissolution inhibitor. In particular, a high molecular-weight novolak resin richer in p-cresol ratio was regarded as an effective matrix of a chemical amplification (CA) positive resist. THP protected phenolic compounds with extended backbone structures showed a large dissolution inhibition. 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Photopol. Sci. Technol.</addtitle><date>1998</date><risdate>1998</risdate><volume>11</volume><issue>4</issue><spage>547</spage><epage>552</epage><pages>547-552</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>The effect of m/p-cresol novolak molecular-weight-distribution (MWD) and dissolution inhibitor structure on resist performance were investigated. A novolak resin richer in p-cresol ratio gave a large dissolution inhibition capability of polymeric dissolution inhibitor, tetrahydropyranyl (THP) protected-polymeric dissolution inhibitor. In particular, a high molecular-weight novolak resin richer in p-cresol ratio was regarded as an effective matrix of a chemical amplification (CA) positive resist. THP protected phenolic compounds with extended backbone structures showed a large dissolution inhibition. The resist with MWD controlled resin and a THP-protected phenolic compound can achieve high resolution patterns (100-nm contact holes ) with high sensitivity (6.0μC/cm2).</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.11.547</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
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| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 1998, Vol.11(4), pp.547-552 |
| issn | 0914-9244 1349-6336 |
| language | eng |
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| source | J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Free Full-Text Journals in Chemistry |
| subjects | dissolution inhibitor electron beam molecular weight distribution novolak |
| title | Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography |
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