Structural Evolution of Sputtered Indium Oxide Thin Films

The indium oxide thin films were deposited at room temperature by reactive magnetron sputtering in the mixture of oxygen and argon on silicon and oxidized silicon substrates. The influence of the oxygen flow in the reactive mixture and post-deposition annealing on the structural properties were inve...

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Veröffentlicht in:	Journal of Electrical Engineering 2010-11, Vol.61 (6), p.382-385
Hauptverfasser:	Hotový, Ivan, Kups, Thomas, Hotový, Juraj, Liday, Jozef, Búc, Dalibor, Čaplovičová, Mária, Řeháček, Vlastimil, Sitter, Helmut, Simbrunner, Clemens, Bonnani, Alberta, Spiess, Lothar
Format:	Artikel
Sprache:	eng
Schlagworte:	cubic indium oxide dc magnetron sputtering In2O3 thin films rhombohedral indium oxide structure
Online-Zugang:	Volltext
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