Photolytic etching of polycrystalline silicon in SF6 atmosphere

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Veröffentlicht in:	Japanese journal of applied physics 1986-11, Vol.25 (11), p.L881-L884
Hauptverfasser:	WATANABE, S, UEDA, S, NAKAZATO, N, TAIKAI, M
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid-fluid interfaces Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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container_end_page	L884
container_issue	11
container_start_page	L881
container_title	Japanese journal of applied physics
container_volume	25
creator	WATANABE, S UEDA, S NAKAZATO, N TAIKAI, M
description
doi_str_mv	10.1143/jjap.25.l881
format	Article
fullrecord	<record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_8366459</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>8366459</sourcerecordid><originalsourceid>FETCH-LOGICAL-j277t-68605c4d85367a69860cbed09654bd3b4a87dee25b772c811dd117f373611cc93</originalsourceid><addsrcrecordid>eNotjs1KxDAYRYMoWEd3PkAWblvz5b8rkcEZhQEHRtdDmqQ2JdOWJpu-vQVdHc5ZXC5Cj0AqAM6e-95MFRVV1BquUAGMq5ITKa5RQQiFkteU3qK7lPpVpeBQoJdjN-YxLjlY7LPtwvCDxxZPa7LzkrKJMQwepxCDHQccBnzaSWzyZUxT52d_j25aE5N_-OcGfe_evrbv5eFz_7F9PZQ9VSqXUksiLHdaMKmMrFe1jXekXl80jjXcaOW8p6JRiloN4ByAapliEsDamm3Q09_uZJI1sZ3NYEM6T3O4mHk5ayYlFzX7BQOLS4s</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Photolytic etching of polycrystalline silicon in SF6 atmosphere</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>WATANABE, S ; UEDA, S ; NAKAZATO, N ; TAIKAI, M</creator><creatorcontrib>WATANABE, S ; UEDA, S ; NAKAZATO, N ; TAIKAI, M</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.25.l881</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Physics ; Solid-fluid interfaces ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Japanese journal of applied physics, 1986-11, Vol.25 (11), p.L881-L884</ispartof><rights>1987 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=8366459$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>WATANABE, S</creatorcontrib><creatorcontrib>UEDA, S</creatorcontrib><creatorcontrib>NAKAZATO, N</creatorcontrib><creatorcontrib>TAIKAI, M</creatorcontrib><title>Photolytic etching of polycrystalline silicon in SF6 atmosphere</title><title>Japanese journal of applied physics</title><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Physics</subject><subject>Solid-fluid interfaces</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1986</creationdate><recordtype>article</recordtype><recordid>eNotjs1KxDAYRYMoWEd3PkAWblvz5b8rkcEZhQEHRtdDmqQ2JdOWJpu-vQVdHc5ZXC5Cj0AqAM6e-95MFRVV1BquUAGMq5ITKa5RQQiFkteU3qK7lPpVpeBQoJdjN-YxLjlY7LPtwvCDxxZPa7LzkrKJMQwepxCDHQccBnzaSWzyZUxT52d_j25aE5N_-OcGfe_evrbv5eFz_7F9PZQ9VSqXUksiLHdaMKmMrFe1jXekXl80jjXcaOW8p6JRiloN4ByAapliEsDamm3Q09_uZJI1sZ3NYEM6T3O4mHk5ayYlFzX7BQOLS4s</recordid><startdate>19861101</startdate><enddate>19861101</enddate><creator>WATANABE, S</creator><creator>UEDA, S</creator><creator>NAKAZATO, N</creator><creator>TAIKAI, M</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope></search><sort><creationdate>19861101</creationdate><title>Photolytic etching of polycrystalline silicon in SF6 atmosphere</title><author>WATANABE, S ; UEDA, S ; NAKAZATO, N ; TAIKAI, M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-j277t-68605c4d85367a69860cbed09654bd3b4a87dee25b772c811dd117f373611cc93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1986</creationdate><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Physics</topic><topic>Solid-fluid interfaces</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>WATANABE, S</creatorcontrib><creatorcontrib>UEDA, S</creatorcontrib><creatorcontrib>NAKAZATO, N</creatorcontrib><creatorcontrib>TAIKAI, M</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Japanese journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>WATANABE, S</au><au>UEDA, S</au><au>NAKAZATO, N</au><au>TAIKAI, M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Photolytic etching of polycrystalline silicon in SF6 atmosphere</atitle><jtitle>Japanese journal of applied physics</jtitle><date>1986-11-01</date><risdate>1986</risdate><volume>25</volume><issue>11</issue><spage>L881</spage><epage>L884</epage><pages>L881-L884</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.25.l881</doi></addata></record>
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identifier	ISSN: 0021-4922
ispartof	Japanese journal of applied physics, 1986-11, Vol.25 (11), p.L881-L884
issn	0021-4922 1347-4065
language	eng
recordid	cdi_pascalfrancis_primary_8366459
source	IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid-fluid interfaces Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
title	Photolytic etching of polycrystalline silicon in SF6 atmosphere
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T13%3A00%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Photolytic%20etching%20of%20polycrystalline%20silicon%20in%20SF6%20atmosphere&rft.jtitle=Japanese%20journal%20of%20applied%20physics&rft.au=WATANABE,%20S&rft.date=1986-11-01&rft.volume=25&rft.issue=11&rft.spage=L881&rft.epage=L884&rft.pages=L881-L884&rft.issn=0021-4922&rft.eissn=1347-4065&rft.coden=JJAPA5&rft_id=info:doi/10.1143/jjap.25.l881&rft_dat=%3Cpascalfrancis%3E8366459%3C/pascalfrancis%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true