Kinetically tailored properties of electron-beam excited XeF(C → A) and XeF(B → X) laser media using an Ar-Kr buffer mixture

Use of a two-component buffer gas comprised of Ar and Kr results in electron-beam excited XeF( C \rightarrow A ) laser pulse energy and intrinsic efficiency values comparable to those of UV rare gas-halide lasers. Herein we report measurements of transient absorption confirming that the primary effe...

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Veröffentlicht in:	IEEE J. Quant. Electron.; (United States) 1987-02, Vol.23 (2), p.253-261
Hauptverfasser:	Nighan, W., Sauerbrey, R., Yunping Zhu, Tittel, F., Wilson, W.
Format:	Artikel
Sprache:	eng
Schlagworte:	420300 - Engineering- Lasers- (-1989) ABSORPTION AMPLIFICATION ARGON BUFFERS DISPERSIONS EFFICIENCY ELECTRICAL PUMPING ELECTROMAGNETIC RADIATION Electromagnetic wave absorption ELECTRON BEAM PUMPING ELEMENTS ENERGY-LEVEL TRANSITIONS ENGINEERING Exact sciences and technology EXCIMER LASERS EXCITATION FLUIDS FLUORIDES FLUORINE COMPOUNDS Fundamental areas of phenomenology (including applications) GAIN GAS LASERS Gas lasers including excimer and metal-vapor lasers GASES HALIDES HALOGEN COMPOUNDS IONIZATION KINETICS KRYPTON KRYPTON FLUORIDE LASERS Laser excitation Laser stability Laser transitions LASERS MIXTURES NONMETALS Optical pulses Optics OSCILLATIONS Physics Power lasers PULSES PUMPING QUANTUM EFFICIENCY RADIATIONS RARE GAS COMPOUNDS RARE GASES Spectral analysis TRANSIENTS ULTRAVIOLET RADIATION WAVELENGTHS XENON COMPOUNDS XENON FLUORIDES
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