Time-resolved study of thin nickel silicide layer growth at the nickel film-Ni(100) interface

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Bibliographische Detailangaben
Hauptverfasser:	JOHN, P. K, FROLICH, H, RASTOGI, A. C, TONG, B. Y
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Analysing. Testing. Standards Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Measurement of properties and materials state Metals, semimetals and alloys Metals. Metallurgy Nondestructive testing Physics Solid surfaces and solid-solid interfaces Specific materials Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
Online-Zugang:	Volltext
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