Thermal instaiblity of the TiSi2/Si structure: impurity effects

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	OGAWA, S, YOSHIDA, T, KOUZAKI, T, OKUDA, S, TSUKAMOTO, K
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page	295
container_issue	1-4
container_start_page	290
container_title
container_volume	41-42
creator	OGAWA, S YOSHIDA, T KOUZAKI, T OKUDA, S TSUKAMOTO, K
description
format	Conference Proceeding
fullrecord	<record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_6719636</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>6719636</sourcerecordid><originalsourceid>FETCH-pascalfrancis_primary_67196363</originalsourceid><addsrcrecordid>eNqNyr0OgjAUQOHGaCL-vEMHVyKlUMDFwWjcYSfXpg3XFCS9ZeDt1cQHcDrD-RYsEmUh4zwvsyWLEqGqOJMyXbMN0TNJRPq5ETs3nfE9OI4DBcCHwzDzl-WhM7zBGtNjjZyCn3SYvDlx7MfJf42x1uhAO7ay4Mjsf92yw-3aXO7xCKTBWQ-DRmpHjz34uVWFqJRU8k_2BnhUO6k</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Thermal instaiblity of the TiSi2/Si structure: impurity effects</title><source>Elsevier ScienceDirect Journals</source><creator>OGAWA, S ; YOSHIDA, T ; KOUZAKI, T ; OKUDA, S ; TSUKAMOTO, K</creator><creatorcontrib>OGAWA, S ; YOSHIDA, T ; KOUZAKI, T ; OKUDA, S ; TSUKAMOTO, K</creatorcontrib><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><language>eng</language><publisher>Amsterdam: Elsevier Science</publisher><subject>Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Physics ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Applied surface science, 1989, Vol.41-42 (1-4), p.290-295</ispartof><rights>1990 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,777,781,786,787,4036,4037,23911,23912,25121</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=6719636$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>OGAWA, S</creatorcontrib><creatorcontrib>YOSHIDA, T</creatorcontrib><creatorcontrib>KOUZAKI, T</creatorcontrib><creatorcontrib>OKUDA, S</creatorcontrib><creatorcontrib>TSUKAMOTO, K</creatorcontrib><title>Thermal instaiblity of the TiSi2/Si structure: impurity effects</title><title>Applied surface science</title><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1989</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNqNyr0OgjAUQOHGaCL-vEMHVyKlUMDFwWjcYSfXpg3XFCS9ZeDt1cQHcDrD-RYsEmUh4zwvsyWLEqGqOJMyXbMN0TNJRPq5ETs3nfE9OI4DBcCHwzDzl-WhM7zBGtNjjZyCn3SYvDlx7MfJf42x1uhAO7ay4Mjsf92yw-3aXO7xCKTBWQ-DRmpHjz34uVWFqJRU8k_2BnhUO6k</recordid><startdate>1989</startdate><enddate>1989</enddate><creator>OGAWA, S</creator><creator>YOSHIDA, T</creator><creator>KOUZAKI, T</creator><creator>OKUDA, S</creator><creator>TSUKAMOTO, K</creator><general>Elsevier Science</general><scope>IQODW</scope></search><sort><creationdate>1989</creationdate><title>Thermal instaiblity of the TiSi2/Si structure: impurity effects</title><author>OGAWA, S ; YOSHIDA, T ; KOUZAKI, T ; OKUDA, S ; TSUKAMOTO, K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-pascalfrancis_primary_67196363</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1989</creationdate><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>OGAWA, S</creatorcontrib><creatorcontrib>YOSHIDA, T</creatorcontrib><creatorcontrib>KOUZAKI, T</creatorcontrib><creatorcontrib>OKUDA, S</creatorcontrib><creatorcontrib>TSUKAMOTO, K</creatorcontrib><collection>Pascal-Francis</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>OGAWA, S</au><au>YOSHIDA, T</au><au>KOUZAKI, T</au><au>OKUDA, S</au><au>TSUKAMOTO, K</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Thermal instaiblity of the TiSi2/Si structure: impurity effects</atitle><btitle>Applied surface science</btitle><date>1989</date><risdate>1989</risdate><volume>41-42</volume><issue>1-4</issue><spage>290</spage><epage>295</epage><pages>290-295</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><cop>Amsterdam</cop><pub>Elsevier Science</pub></addata></record>
fulltext	fulltext
identifier	ISSN: 0169-4332
ispartof	Applied surface science, 1989, Vol.41-42 (1-4), p.290-295
issn	0169-4332 1873-5584
language	eng
recordid	cdi_pascalfrancis_primary_6719636
source	Elsevier ScienceDirect Journals
subjects	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
title	Thermal instaiblity of the TiSi2/Si structure: impurity effects
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T08%3A09%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Thermal%20instaiblity%20of%20the%20TiSi2/Si%20structure:%20impurity%20effects&rft.btitle=Applied%20surface%20science&rft.au=OGAWA,%20S&rft.date=1989&rft.volume=41-42&rft.issue=1-4&rft.spage=290&rft.epage=295&rft.pages=290-295&rft.issn=0169-4332&rft.eissn=1873-5584&rft_id=info:doi/&rft_dat=%3Cpascalfrancis%3E6719636%3C/pascalfrancis%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true