Mechanistic study of silicon etching in HF-KBrI3-H2O solution
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Veröffentlicht in: | Journal of the Electrochemical Society 1993, Vol.140 (5), p.1453-1458 |
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ispartof | Journal of the Electrochemical Society, 1993, Vol.140 (5), p.1453-1458 |
issn | 0013-4651 1945-7111 |
language | eng |
recordid | cdi_pascalfrancis_primary_4796731 |
source | IOP Publishing Journals |
subjects | Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Mechanical and acoustical properties adhesion Physics Solid surfaces and solid-solid interfaces Solid-fluid interfaces Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
title | Mechanistic study of silicon etching in HF-KBrI3-H2O solution |
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