Batch processing for micromachined devices
Micromachined device technology has emerged during the last three decades. At first it was mainly a technological spin-off from microelectronics/integrated circuit technology. Sensor applications gave the main market pull, batch processing the key to high quality at low cost and silicon micromachini...
Gespeichert in:
Veröffentlicht in: | Journal of micromechanics and microengineering 1995-06, Vol.5 (2), p.47-56 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 56 |
---|---|
container_issue | 2 |
container_start_page | 47 |
container_title | Journal of micromechanics and microengineering |
container_volume | 5 |
creator | Ohlckers, P Hanneborg, A Nese, M |
description | Micromachined device technology has emerged during the last three decades. At first it was mainly a technological spin-off from microelectronics/integrated circuit technology. Sensor applications gave the main market pull, batch processing the key to high quality at low cost and silicon micromachining established itself as a unique process technology with distinctive features. Today, these devices have matured into a separate industry sector with their own market and manufacturing infrastructure, also with micromachining of other materials than silicon. They are used in microelectronic systems with widespread applications, ranging from low-cost, high-volume automotive applications to high-cost, low-volume instrumentation applications. The micromachined devices have during these years shown a much slower learning curve than microelectronics in general, making them bottlenecks for performance and cost improvements in their systems. The herald of the rapid development of integrated circuit technology - batch processing - is one of the important keys to ease these bottlenecks. The most important batch processes for micromachined devices are highlighted, and recommendations for future batch processing developments for micromachined devices are given. |
doi_str_mv | 10.1088/0960-1317/5/2/001 |
format | Article |
fullrecord | <record><control><sourceid>proquest_pasca</sourceid><recordid>TN_cdi_pascalfrancis_primary_3583416</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>745131225</sourcerecordid><originalsourceid>FETCH-LOGICAL-c405t-5d1f8b61208a5c020bcc79d405e4e17a548fc57d5d041c39a7391dac61e0bdca3</originalsourceid><addsrcrecordid>eNp9kEtLAzEUhYMoWKs_wN0sREUcJzeZTDJLLb6g4EbXIb3J2Mi8nLSC_94MlW6Kru7ifOdw7iHkFOgNUKUyWhY0BQ4yExnLKIU9MgFeQFrkvNwnk61-SI5C-IgAKFATcnVnVrhM-qFDF4Jv35OqG5LG49A1Bpe-dTax7stH9ZgcVKYO7uT3Tsnbw_3r7Cmdvzw-z27nKeZUrFJhoVKLAhhVRiBldIEoSxs1lzuQRuSqQiGtsDQH5KWRvARrsABHFxYNn5KLTW4s9bl2YaUbH9DVtWldtw5a5iI-wpiI5Pm_JJMcSiaLCMIGjG-FMLhK94NvzPCtgepxPz3uo8d9tNBMx3mi5-w33AQ0dTWYFn3YGrlQPIcx-nKD-a7fijtpurdVRK930b8L_ACukofq</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27319276</pqid></control><display><type>article</type><title>Batch processing for micromachined devices</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Ohlckers, P ; Hanneborg, A ; Nese, M</creator><creatorcontrib>Ohlckers, P ; Hanneborg, A ; Nese, M</creatorcontrib><description>Micromachined device technology has emerged during the last three decades. At first it was mainly a technological spin-off from microelectronics/integrated circuit technology. Sensor applications gave the main market pull, batch processing the key to high quality at low cost and silicon micromachining established itself as a unique process technology with distinctive features. Today, these devices have matured into a separate industry sector with their own market and manufacturing infrastructure, also with micromachining of other materials than silicon. They are used in microelectronic systems with widespread applications, ranging from low-cost, high-volume automotive applications to high-cost, low-volume instrumentation applications. The micromachined devices have during these years shown a much slower learning curve than microelectronics in general, making them bottlenecks for performance and cost improvements in their systems. The herald of the rapid development of integrated circuit technology - batch processing - is one of the important keys to ease these bottlenecks. The most important batch processes for micromachined devices are highlighted, and recommendations for future batch processing developments for micromachined devices are given.</description><identifier>ISSN: 0960-1317</identifier><identifier>EISSN: 1361-6439</identifier><identifier>DOI: 10.1088/0960-1317/5/2/001</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Actuators ; Applied sciences ; Electronics ; Exact sciences and technology ; Integrated circuits ; Microelectronic fabrication (materials and surfaces technology) ; Microelectronic processing ; Microelectronics ; Semiconducting silicon ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Sensors</subject><ispartof>Journal of micromechanics and microengineering, 1995-06, Vol.5 (2), p.47-56</ispartof><rights>1995 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c405t-5d1f8b61208a5c020bcc79d405e4e17a548fc57d5d041c39a7391dac61e0bdca3</citedby><cites>FETCH-LOGICAL-c405t-5d1f8b61208a5c020bcc79d405e4e17a548fc57d5d041c39a7391dac61e0bdca3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0960-1317/5/2/001/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925,53830,53910</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3583416$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Ohlckers, P</creatorcontrib><creatorcontrib>Hanneborg, A</creatorcontrib><creatorcontrib>Nese, M</creatorcontrib><title>Batch processing for micromachined devices</title><title>Journal of micromechanics and microengineering</title><description>Micromachined device technology has emerged during the last three decades. At first it was mainly a technological spin-off from microelectronics/integrated circuit technology. Sensor applications gave the main market pull, batch processing the key to high quality at low cost and silicon micromachining established itself as a unique process technology with distinctive features. Today, these devices have matured into a separate industry sector with their own market and manufacturing infrastructure, also with micromachining of other materials than silicon. They are used in microelectronic systems with widespread applications, ranging from low-cost, high-volume automotive applications to high-cost, low-volume instrumentation applications. The micromachined devices have during these years shown a much slower learning curve than microelectronics in general, making them bottlenecks for performance and cost improvements in their systems. The herald of the rapid development of integrated circuit technology - batch processing - is one of the important keys to ease these bottlenecks. The most important batch processes for micromachined devices are highlighted, and recommendations for future batch processing developments for micromachined devices are given.</description><subject>Actuators</subject><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Integrated circuits</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Microelectronic processing</subject><subject>Microelectronics</subject><subject>Semiconducting silicon</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Sensors</subject><issn>0960-1317</issn><issn>1361-6439</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNp9kEtLAzEUhYMoWKs_wN0sREUcJzeZTDJLLb6g4EbXIb3J2Mi8nLSC_94MlW6Kru7ifOdw7iHkFOgNUKUyWhY0BQ4yExnLKIU9MgFeQFrkvNwnk61-SI5C-IgAKFATcnVnVrhM-qFDF4Jv35OqG5LG49A1Bpe-dTax7stH9ZgcVKYO7uT3Tsnbw_3r7Cmdvzw-z27nKeZUrFJhoVKLAhhVRiBldIEoSxs1lzuQRuSqQiGtsDQH5KWRvARrsABHFxYNn5KLTW4s9bl2YaUbH9DVtWldtw5a5iI-wpiI5Pm_JJMcSiaLCMIGjG-FMLhK94NvzPCtgepxPz3uo8d9tNBMx3mi5-w33AQ0dTWYFn3YGrlQPIcx-nKD-a7fijtpurdVRK930b8L_ACukofq</recordid><startdate>19950601</startdate><enddate>19950601</enddate><creator>Ohlckers, P</creator><creator>Hanneborg, A</creator><creator>Nese, M</creator><general>IOP Publishing</general><general>Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>7TC</scope></search><sort><creationdate>19950601</creationdate><title>Batch processing for micromachined devices</title><author>Ohlckers, P ; Hanneborg, A ; Nese, M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c405t-5d1f8b61208a5c020bcc79d405e4e17a548fc57d5d041c39a7391dac61e0bdca3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><topic>Actuators</topic><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Integrated circuits</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Microelectronic processing</topic><topic>Microelectronics</topic><topic>Semiconducting silicon</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Sensors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ohlckers, P</creatorcontrib><creatorcontrib>Hanneborg, A</creatorcontrib><creatorcontrib>Nese, M</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Mechanical Engineering Abstracts</collection><jtitle>Journal of micromechanics and microengineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ohlckers, P</au><au>Hanneborg, A</au><au>Nese, M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Batch processing for micromachined devices</atitle><jtitle>Journal of micromechanics and microengineering</jtitle><date>1995-06-01</date><risdate>1995</risdate><volume>5</volume><issue>2</issue><spage>47</spage><epage>56</epage><pages>47-56</pages><issn>0960-1317</issn><eissn>1361-6439</eissn><abstract>Micromachined device technology has emerged during the last three decades. At first it was mainly a technological spin-off from microelectronics/integrated circuit technology. Sensor applications gave the main market pull, batch processing the key to high quality at low cost and silicon micromachining established itself as a unique process technology with distinctive features. Today, these devices have matured into a separate industry sector with their own market and manufacturing infrastructure, also with micromachining of other materials than silicon. They are used in microelectronic systems with widespread applications, ranging from low-cost, high-volume automotive applications to high-cost, low-volume instrumentation applications. The micromachined devices have during these years shown a much slower learning curve than microelectronics in general, making them bottlenecks for performance and cost improvements in their systems. The herald of the rapid development of integrated circuit technology - batch processing - is one of the important keys to ease these bottlenecks. The most important batch processes for micromachined devices are highlighted, and recommendations for future batch processing developments for micromachined devices are given.</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><doi>10.1088/0960-1317/5/2/001</doi><tpages>10</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0960-1317 |
ispartof | Journal of micromechanics and microengineering, 1995-06, Vol.5 (2), p.47-56 |
issn | 0960-1317 1361-6439 |
language | eng |
recordid | cdi_pascalfrancis_primary_3583416 |
source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
subjects | Actuators Applied sciences Electronics Exact sciences and technology Integrated circuits Microelectronic fabrication (materials and surfaces technology) Microelectronic processing Microelectronics Semiconducting silicon Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Sensors |
title | Batch processing for micromachined devices |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-20T05%3A41%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Batch%20processing%20for%20micromachined%20devices&rft.jtitle=Journal%20of%20micromechanics%20and%20microengineering&rft.au=Ohlckers,%20P&rft.date=1995-06-01&rft.volume=5&rft.issue=2&rft.spage=47&rft.epage=56&rft.pages=47-56&rft.issn=0960-1317&rft.eissn=1361-6439&rft_id=info:doi/10.1088/0960-1317/5/2/001&rft_dat=%3Cproquest_pasca%3E745131225%3C/proquest_pasca%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27319276&rft_id=info:pmid/&rfr_iscdi=true |