Growth and structure characterization of EuSi2 films and nanoislands on vicinal Si(001) surface
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Veröffentlicht in: | Journal of crystal growth 2014-12, Vol.407, p.74-77 |
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container_title | Journal of crystal growth |
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creator | SEILER, A BAUDER, O IBRAHIMKUTTY, S PRADIP, R PRÜSSMANN, T VITOVA, T FIEDERLE, M BAUMBACH, T STANKOV, S |
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doi_str_mv | 10.1016/j.jcrysgro.2014.09.005 |
format | Article |
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subjects | Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Electron diffraction and scattering Exact sciences and technology Low-energy electron diffraction (leed) and reflection high-energy electron diffraction (rheed) Materials science Methods of crystal growth physics of crystal growth Methods of deposition of films and coatings film growth and epitaxy Molecular, atomic, ion, and chemical beam epitaxy Physics Structure of solids and liquids crystallography Theory and models of crystal growth physics of crystal growth, crystal morphology and orientation |
title | Growth and structure characterization of EuSi2 films and nanoislands on vicinal Si(001) surface |
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