Fabrication of silica nanostructures with a microwave assisted direct patterning process
Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micr...
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| Veröffentlicht in: | Nanotechnology 2014-06, Vol.25 (22), p.225301-225301 |
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| container_issue | 22 |
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| container_title | Nanotechnology |
| container_volume | 25 |
| creator | Shin, Ju-Hyeon Go, Bit-Na Choi, Je-Hong Kim, Jin-Seoung Jung, Gun-Young Kim, Heetae Lee, Heon |
| description | Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro- to nano-sized structures, including moth-eye patterns of SiO2, which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, moth-eye and 50 nm sized line space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out. |
| doi_str_mv | 10.1088/0957-4484/25/22/225301 |
| format | Article |
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During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro- to nano-sized structures, including moth-eye patterns of SiO2, which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, moth-eye and 50 nm sized line space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out.</description><identifier>ISSN: 0957-4484</identifier><identifier>EISSN: 1361-6528</identifier><identifier>DOI: 10.1088/0957-4484/25/22/225301</identifier><identifier>PMID: 24833169</identifier><identifier>CODEN: NNOTER</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Glass ; Heating ; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties ; Materials science ; Methods of nanofabrication ; microwave assisted direct patterning ; microwave heating ; Microwaves ; moth-eye pattern ; nano-particle dispersed solution ; Nanocrystalline materials ; Nanolithography ; Nanoscale materials and structures: fabrication and characterization ; Nanoscale pattern formation ; Nanostructure ; Patterning ; PDMS mold ; Physics ; Scanning electron microscopy ; Silicon dioxide ; SiO ; soft lithography ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin films</subject><ispartof>Nanotechnology, 2014-06, Vol.25 (22), p.225301-225301</ispartof><rights>2014 IOP Publishing Ltd</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c451t-dc1cfcd18affc97ec60c4676221a4aa7fd91959f559df28ef47ff28f583c72a63</citedby><cites>FETCH-LOGICAL-c451t-dc1cfcd18affc97ec60c4676221a4aa7fd91959f559df28ef47ff28f583c72a63</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0957-4484/25/22/225301/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,776,780,27901,27902,53821,53868</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=28495212$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/24833169$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Shin, Ju-Hyeon</creatorcontrib><creatorcontrib>Go, Bit-Na</creatorcontrib><creatorcontrib>Choi, Je-Hong</creatorcontrib><creatorcontrib>Kim, Jin-Seoung</creatorcontrib><creatorcontrib>Jung, Gun-Young</creatorcontrib><creatorcontrib>Kim, Heetae</creatorcontrib><creatorcontrib>Lee, Heon</creatorcontrib><title>Fabrication of silica nanostructures with a microwave assisted direct patterning process</title><title>Nanotechnology</title><addtitle>NANO</addtitle><addtitle>Nanotechnology</addtitle><description>Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro- to nano-sized structures, including moth-eye patterns of SiO2, which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, moth-eye and 50 nm sized line space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out.</description><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Glass</subject><subject>Heating</subject><subject>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</subject><subject>Materials science</subject><subject>Methods of nanofabrication</subject><subject>microwave assisted direct patterning</subject><subject>microwave heating</subject><subject>Microwaves</subject><subject>moth-eye pattern</subject><subject>nano-particle dispersed solution</subject><subject>Nanocrystalline materials</subject><subject>Nanolithography</subject><subject>Nanoscale materials and structures: fabrication and characterization</subject><subject>Nanoscale pattern formation</subject><subject>Nanostructure</subject><subject>Patterning</subject><subject>PDMS mold</subject><subject>Physics</subject><subject>Scanning electron microscopy</subject><subject>Silicon dioxide</subject><subject>SiO</subject><subject>soft lithography</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin films</subject><issn>0957-4484</issn><issn>1361-6528</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNqFkVFrFTEQhYMo9lr9CyUvgj6sN5lNstnHUqwKpX1R8C1Ms4mm7N1dM1mL_95c7rUiCIXAEPjOnJkzjJ1J8U4Ka7ei112jlFVb0FuA-nQr5BO2ka2RjdFgn7LNA3TCXhDdCSGlBfmcnYCybStNv2FfL_E2J48lzROfI6c01h-fcJqp5NWXNQfi96l858h3yef5Hn8GjkSJShj4kHLwhS9YSshTmr7xJc8-EL1kzyKOFF4d6yn7cvn-88XH5urmw6eL86vGKy1LM3jpox-kxRh93wVvhFemMwASFWIXh172uo9a90MEG6LqYq1R29Z3gKY9ZW8OfavvjzVQcbtEPowjTmFeyUnTSW0NGPs4qltjLAgBFTUHtC5MlEN0S047zL-cFG5_ALfP1u2zdaAdgDscoArPjh7r7S4MD7I_iVfg9RFA8jjGjJNP9Jezqtcg9xPAgUvz4u7mNU81xcfd3_5HdH1-ffMP55Yhtr8B8uqrPg</recordid><startdate>20140606</startdate><enddate>20140606</enddate><creator>Shin, Ju-Hyeon</creator><creator>Go, Bit-Na</creator><creator>Choi, Je-Hong</creator><creator>Kim, Jin-Seoung</creator><creator>Jung, Gun-Young</creator><creator>Kim, Heetae</creator><creator>Lee, Heon</creator><general>IOP Publishing</general><general>Institute of Physics</general><scope>IQODW</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20140606</creationdate><title>Fabrication of silica nanostructures with a microwave assisted direct patterning process</title><author>Shin, Ju-Hyeon ; Go, Bit-Na ; Choi, Je-Hong ; Kim, Jin-Seoung ; Jung, Gun-Young ; Kim, Heetae ; Lee, Heon</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c451t-dc1cfcd18affc97ec60c4676221a4aa7fd91959f559df28ef47ff28f583c72a63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Glass</topic><topic>Heating</topic><topic>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</topic><topic>Materials science</topic><topic>Methods of nanofabrication</topic><topic>microwave assisted direct patterning</topic><topic>microwave heating</topic><topic>Microwaves</topic><topic>moth-eye pattern</topic><topic>nano-particle dispersed solution</topic><topic>Nanocrystalline materials</topic><topic>Nanolithography</topic><topic>Nanoscale materials and structures: fabrication and characterization</topic><topic>Nanoscale pattern formation</topic><topic>Nanostructure</topic><topic>Patterning</topic><topic>PDMS mold</topic><topic>Physics</topic><topic>Scanning electron microscopy</topic><topic>Silicon dioxide</topic><topic>SiO</topic><topic>soft lithography</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Shin, Ju-Hyeon</creatorcontrib><creatorcontrib>Go, Bit-Na</creatorcontrib><creatorcontrib>Choi, Je-Hong</creatorcontrib><creatorcontrib>Kim, Jin-Seoung</creatorcontrib><creatorcontrib>Jung, Gun-Young</creatorcontrib><creatorcontrib>Kim, Heetae</creatorcontrib><creatorcontrib>Lee, Heon</creatorcontrib><collection>Pascal-Francis</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Shin, Ju-Hyeon</au><au>Go, Bit-Na</au><au>Choi, Je-Hong</au><au>Kim, Jin-Seoung</au><au>Jung, Gun-Young</au><au>Kim, Heetae</au><au>Lee, Heon</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of silica nanostructures with a microwave assisted direct patterning process</atitle><jtitle>Nanotechnology</jtitle><stitle>NANO</stitle><addtitle>Nanotechnology</addtitle><date>2014-06-06</date><risdate>2014</risdate><volume>25</volume><issue>22</issue><spage>225301</spage><epage>225301</epage><pages>225301-225301</pages><issn>0957-4484</issn><eissn>1361-6528</eissn><coden>NNOTER</coden><abstract>Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro- to nano-sized structures, including moth-eye patterns of SiO2, which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, moth-eye and 50 nm sized line space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out.</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><pmid>24833169</pmid><doi>10.1088/0957-4484/25/22/225301</doi><tpages>7</tpages></addata></record> |
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| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Glass Heating Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Materials science Methods of nanofabrication microwave assisted direct patterning microwave heating Microwaves moth-eye pattern nano-particle dispersed solution Nanocrystalline materials Nanolithography Nanoscale materials and structures: fabrication and characterization Nanoscale pattern formation Nanostructure Patterning PDMS mold Physics Scanning electron microscopy Silicon dioxide SiO soft lithography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin films |
| title | Fabrication of silica nanostructures with a microwave assisted direct patterning process |
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