Improvement in the Photo-Bias Stability of Zinc Tin Oxide Thin-Film Transistors by Introducing a Thermal Oxidized TiO2 Film as a Hole Carrier Blocking Layer

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Veröffentlicht in:IEEE transactions on electron devices 2013-12, Vol.60 (12), p.4165-4172
Hauptverfasser: LEE, Chang-Kyu, AH YOUNG HWANG, HOICHANG YANG, KIM, Dae-Hwan, BAE, Jong-Uk, SHIN, Woo-Sup, JAE KYEONG JEONG
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container_end_page 4172
container_issue 12
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container_title IEEE transactions on electron devices
container_volume 60
creator LEE, Chang-Kyu
AH YOUNG HWANG
HOICHANG YANG
KIM, Dae-Hwan
BAE, Jong-Uk
SHIN, Woo-Sup
JAE KYEONG JEONG
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doi_str_mv 10.1109/TED.2013.2286819
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source IEEE Electronic Library (IEL)
subjects Applied sciences
Cross-disciplinary physics: materials science
rheology
Electronics
Exact sciences and technology
Materials science
Nanocrystalline materials
Nanoscale materials and structures: fabrication and characterization
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
title Improvement in the Photo-Bias Stability of Zinc Tin Oxide Thin-Film Transistors by Introducing a Thermal Oxidized TiO2 Film as a Hole Carrier Blocking Layer
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