SU-8 2002 Surface Micromachined Deformable Membrane Mirrors

This paper describes two surface micromachining processes, i.e., one using a wet-etch release and the other using a dry-etch release, to create deformable membrane mirrors made from a thin film of low-stress SU-8 2002. The mirrors are designed for electronic focus and aberration control in imaging s...

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Veröffentlicht in:Journal of microelectromechanical systems 2013-02, Vol.22 (1), p.94-106
Hauptverfasser: Lukes, S. J., Dickensheets, D. L.
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Dickensheets, D. L.
description This paper describes two surface micromachining processes, i.e., one using a wet-etch release and the other using a dry-etch release, to create deformable membrane mirrors made from a thin film of low-stress SU-8 2002. The mirrors are designed for electronic focus and aberration control in imaging systems, and exhibit a large range of motion and high optical quality. The processes result in free-standing membrane mirrors with in-plane film stress as low as 12.5 MPa while attaining well-defined lithographic features as small as 3 μm in a 2.5-μm-thick film. We achieved a maximum deflection of 14.8 μm for a 3-mm × 4.24-mm elliptical boundary mirror, limited by electrostatic pull-in. Using a 3-mm × 4.24-mm mirror, which is designed for operation with a circular beam at 45° incidence angle, we demonstrate focus control while compensating spherical aberration in an optical microscope over a depth of 137 μm using a 50× 0.4-NA objective lens.
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L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>SU-8 2002 Surface Micromachined Deformable Membrane Mirrors</atitle><jtitle>Journal of microelectromechanical systems</jtitle><stitle>JMEMS</stitle><date>2013-02-01</date><risdate>2013</risdate><volume>22</volume><issue>1</issue><spage>94</spage><epage>106</epage><pages>94-106</pages><issn>1057-7157</issn><eissn>1941-0158</eissn><coden>JMIYET</coden><abstract>This paper describes two surface micromachining processes, i.e., one using a wet-etch release and the other using a dry-etch release, to create deformable membrane mirrors made from a thin film of low-stress SU-8 2002. The mirrors are designed for electronic focus and aberration control in imaging systems, and exhibit a large range of motion and high optical quality. The processes result in free-standing membrane mirrors with in-plane film stress as low as 12.5 MPa while attaining well-defined lithographic features as small as 3 μm in a 2.5-μm-thick film. We achieved a maximum deflection of 14.8 μm for a 3-mm × 4.24-mm elliptical boundary mirror, limited by electrostatic pull-in. Using a 3-mm × 4.24-mm mirror, which is designed for operation with a circular beam at 45° incidence angle, we demonstrate focus control while compensating spherical aberration in an optical microscope over a depth of 137 μm using a 50× 0.4-NA objective lens.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/JMEMS.2012.2215010</doi><tpages>13</tpages></addata></record>
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subjects Deformable mirror
Etching
Exact sciences and technology
focus control
hbox{XeF}_{2}
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Lenses
Mechanical instruments, equipment and techniques
microelectromechanical systems (MEMS)
Micromechanical devices and systems
Mirrors
Optical imaging
Physics
Silicon
Stress
SU-8 2002
tetramethylammonium hydroxide (TMAH)
variable-power lens
title SU-8 2002 Surface Micromachined Deformable Membrane Mirrors
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