Measuring the roughness of buried interfaces by sputter depth profiling
We report results of high-resolution sputter depth profiling of an alternating MgO/ZnO nanolayer stack grown by atomic layer deposition (ALD) of 5.5 nm per layer. We used an improved dual beam time-of-flight secondary ion mass spectrometer to measure 24Mg+ and 64Zn+ intensities as a function of samp...
Gespeichert in:
| Veröffentlicht in: | Nanotechnology 2013-01, Vol.24 (1), p.015708-015708 |
|---|---|
| Hauptverfasser: | , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 015708 |
|---|---|
| container_issue | 1 |
| container_start_page | 015708 |
| container_title | Nanotechnology |
| container_volume | 24 |
| creator | Baryshev, S V Klug, J A Zinovev, A V Tripa, C E Peng, Q Elam, J W Veryovkin, I V |
| description | We report results of high-resolution sputter depth profiling of an alternating MgO/ZnO nanolayer stack grown by atomic layer deposition (ALD) of 5.5 nm per layer. We used an improved dual beam time-of-flight secondary ion mass spectrometer to measure 24Mg+ and 64Zn+ intensities as a function of sample depth. Analysis of depth profiles by the mixing-roughness-information model yields a 1.5 nm nanolayer interfacial roughness within the MgO/ZnO multilayer. This finding was cross-validated using specular x-ray reflectivity. Such an analysis further suggested that the 1.5 nm roughness corresponds to native/jig-sawed interfacial roughness rather than interfacial interdiffusion during the ALD growth. |
| doi_str_mv | 10.1088/0957-4484/24/1/015708 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_pasca</sourceid><recordid>TN_cdi_pascalfrancis_primary_26843247</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1323216482</sourcerecordid><originalsourceid>FETCH-LOGICAL-c488t-2f161faad31cd2ad414b78871603035ff342a5b28c1b813237cf77ae61eff32e3</originalsourceid><addsrcrecordid>eNqNkUFvFSEUhYnR2Gf1J2iIiYmb6eNeGKBL02g1aeOmXROGgT6aeTMjMIv-e5nMsy51RYDv3HNzDiHvgV0A03rPLlvVCKHFHsUe9gxaxfQLsgMuoZEt6pdk98yckTc5PzIGoBFekzPkiBXEHbm-9TYvKY4PtBw8TdPycBh9znQKtKvvvqdxLD4F63ym3RPN81LqnfZ-Lgc6pynEoarfklfBDtm_O53n5P7b17ur783Nz-sfV19uGie0Lg0GkBCs7Tm4Hm0vQHRKawWSccbbELhA23aoHXQaOHLlglLWS_D1Dz0_Jx-3uVMu0WQXi3cHN42jd8UAkyAEVujzBtX1fi0-F3OM2flhsKOflmzWwQhS6P9AkV8yyYRa0XZDXZpyTj6YOcWjTU_V16ydmDVvs-ZtUBgwWydV9-FksXRH3z-r_pRQgU8nwGZnh5Ds6GL-y0ktOApVOdi4OM3mcVrSWJP-h_lvsemhEg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1239060472</pqid></control><display><type>article</type><title>Measuring the roughness of buried interfaces by sputter depth profiling</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Baryshev, S V ; Klug, J A ; Zinovev, A V ; Tripa, C E ; Peng, Q ; Elam, J W ; Veryovkin, I V</creator><creatorcontrib>Baryshev, S V ; Klug, J A ; Zinovev, A V ; Tripa, C E ; Peng, Q ; Elam, J W ; Veryovkin, I V ; Argonne National Lab. (ANL), Argonne, IL (United States)</creatorcontrib><description>We report results of high-resolution sputter depth profiling of an alternating MgO/ZnO nanolayer stack grown by atomic layer deposition (ALD) of 5.5 nm per layer. We used an improved dual beam time-of-flight secondary ion mass spectrometer to measure 24Mg+ and 64Zn+ intensities as a function of sample depth. Analysis of depth profiles by the mixing-roughness-information model yields a 1.5 nm nanolayer interfacial roughness within the MgO/ZnO multilayer. This finding was cross-validated using specular x-ray reflectivity. Such an analysis further suggested that the 1.5 nm roughness corresponds to native/jig-sawed interfacial roughness rather than interfacial interdiffusion during the ALD growth.</description><identifier>ISSN: 0957-4484</identifier><identifier>EISSN: 1361-6528</identifier><identifier>DOI: 10.1088/0957-4484/24/1/015708</identifier><identifier>PMID: 23221362</identifier><identifier>CODEN: NNOTER</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Beams (radiation) ; Condensed matter: structure, mechanical and thermal properties ; Depth profiling ; Electron, ion, and scanning probe microscopy ; Exact sciences and technology ; Magnesium oxide ; Nanocomposites ; Nanomaterials ; Nanostructure ; Physics ; Roughness ; Structure of solids and liquids; crystallography ; Zinc oxide</subject><ispartof>Nanotechnology, 2013-01, Vol.24 (1), p.015708-015708</ispartof><rights>2013 IOP Publishing Ltd</rights><rights>2014 INIST-CNRS</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c488t-2f161faad31cd2ad414b78871603035ff342a5b28c1b813237cf77ae61eff32e3</citedby><cites>FETCH-LOGICAL-c488t-2f161faad31cd2ad414b78871603035ff342a5b28c1b813237cf77ae61eff32e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0957-4484/24/1/015708/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,885,27924,27925,53846,53893</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=26843247$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/23221362$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/1061442$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Baryshev, S V</creatorcontrib><creatorcontrib>Klug, J A</creatorcontrib><creatorcontrib>Zinovev, A V</creatorcontrib><creatorcontrib>Tripa, C E</creatorcontrib><creatorcontrib>Peng, Q</creatorcontrib><creatorcontrib>Elam, J W</creatorcontrib><creatorcontrib>Veryovkin, I V</creatorcontrib><creatorcontrib>Argonne National Lab. (ANL), Argonne, IL (United States)</creatorcontrib><title>Measuring the roughness of buried interfaces by sputter depth profiling</title><title>Nanotechnology</title><addtitle>Nano</addtitle><addtitle>Nanotechnology</addtitle><description>We report results of high-resolution sputter depth profiling of an alternating MgO/ZnO nanolayer stack grown by atomic layer deposition (ALD) of 5.5 nm per layer. We used an improved dual beam time-of-flight secondary ion mass spectrometer to measure 24Mg+ and 64Zn+ intensities as a function of sample depth. Analysis of depth profiles by the mixing-roughness-information model yields a 1.5 nm nanolayer interfacial roughness within the MgO/ZnO multilayer. This finding was cross-validated using specular x-ray reflectivity. Such an analysis further suggested that the 1.5 nm roughness corresponds to native/jig-sawed interfacial roughness rather than interfacial interdiffusion during the ALD growth.</description><subject>Beams (radiation)</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Depth profiling</subject><subject>Electron, ion, and scanning probe microscopy</subject><subject>Exact sciences and technology</subject><subject>Magnesium oxide</subject><subject>Nanocomposites</subject><subject>Nanomaterials</subject><subject>Nanostructure</subject><subject>Physics</subject><subject>Roughness</subject><subject>Structure of solids and liquids; crystallography</subject><subject>Zinc oxide</subject><issn>0957-4484</issn><issn>1361-6528</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqNkUFvFSEUhYnR2Gf1J2iIiYmb6eNeGKBL02g1aeOmXROGgT6aeTMjMIv-e5nMsy51RYDv3HNzDiHvgV0A03rPLlvVCKHFHsUe9gxaxfQLsgMuoZEt6pdk98yckTc5PzIGoBFekzPkiBXEHbm-9TYvKY4PtBw8TdPycBh9znQKtKvvvqdxLD4F63ym3RPN81LqnfZ-Lgc6pynEoarfklfBDtm_O53n5P7b17ur783Nz-sfV19uGie0Lg0GkBCs7Tm4Hm0vQHRKawWSccbbELhA23aoHXQaOHLlglLWS_D1Dz0_Jx-3uVMu0WQXi3cHN42jd8UAkyAEVujzBtX1fi0-F3OM2flhsKOflmzWwQhS6P9AkV8yyYRa0XZDXZpyTj6YOcWjTU_V16ydmDVvs-ZtUBgwWydV9-FksXRH3z-r_pRQgU8nwGZnh5Ds6GL-y0ktOApVOdi4OM3mcVrSWJP-h_lvsemhEg</recordid><startdate>20130111</startdate><enddate>20130111</enddate><creator>Baryshev, S V</creator><creator>Klug, J A</creator><creator>Zinovev, A V</creator><creator>Tripa, C E</creator><creator>Peng, Q</creator><creator>Elam, J W</creator><creator>Veryovkin, I V</creator><general>IOP Publishing</general><general>Institute of Physics</general><scope>IQODW</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7QF</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>20130111</creationdate><title>Measuring the roughness of buried interfaces by sputter depth profiling</title><author>Baryshev, S V ; Klug, J A ; Zinovev, A V ; Tripa, C E ; Peng, Q ; Elam, J W ; Veryovkin, I V</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c488t-2f161faad31cd2ad414b78871603035ff342a5b28c1b813237cf77ae61eff32e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Beams (radiation)</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Depth profiling</topic><topic>Electron, ion, and scanning probe microscopy</topic><topic>Exact sciences and technology</topic><topic>Magnesium oxide</topic><topic>Nanocomposites</topic><topic>Nanomaterials</topic><topic>Nanostructure</topic><topic>Physics</topic><topic>Roughness</topic><topic>Structure of solids and liquids; crystallography</topic><topic>Zinc oxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Baryshev, S V</creatorcontrib><creatorcontrib>Klug, J A</creatorcontrib><creatorcontrib>Zinovev, A V</creatorcontrib><creatorcontrib>Tripa, C E</creatorcontrib><creatorcontrib>Peng, Q</creatorcontrib><creatorcontrib>Elam, J W</creatorcontrib><creatorcontrib>Veryovkin, I V</creatorcontrib><creatorcontrib>Argonne National Lab. (ANL), Argonne, IL (United States)</creatorcontrib><collection>Pascal-Francis</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Aluminium Industry Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection><jtitle>Nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Baryshev, S V</au><au>Klug, J A</au><au>Zinovev, A V</au><au>Tripa, C E</au><au>Peng, Q</au><au>Elam, J W</au><au>Veryovkin, I V</au><aucorp>Argonne National Lab. (ANL), Argonne, IL (United States)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Measuring the roughness of buried interfaces by sputter depth profiling</atitle><jtitle>Nanotechnology</jtitle><stitle>Nano</stitle><addtitle>Nanotechnology</addtitle><date>2013-01-11</date><risdate>2013</risdate><volume>24</volume><issue>1</issue><spage>015708</spage><epage>015708</epage><pages>015708-015708</pages><issn>0957-4484</issn><eissn>1361-6528</eissn><coden>NNOTER</coden><abstract>We report results of high-resolution sputter depth profiling of an alternating MgO/ZnO nanolayer stack grown by atomic layer deposition (ALD) of 5.5 nm per layer. We used an improved dual beam time-of-flight secondary ion mass spectrometer to measure 24Mg+ and 64Zn+ intensities as a function of sample depth. Analysis of depth profiles by the mixing-roughness-information model yields a 1.5 nm nanolayer interfacial roughness within the MgO/ZnO multilayer. This finding was cross-validated using specular x-ray reflectivity. Such an analysis further suggested that the 1.5 nm roughness corresponds to native/jig-sawed interfacial roughness rather than interfacial interdiffusion during the ALD growth.</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><pmid>23221362</pmid><doi>10.1088/0957-4484/24/1/015708</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0957-4484 |
| ispartof | Nanotechnology, 2013-01, Vol.24 (1), p.015708-015708 |
| issn | 0957-4484 1361-6528 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_26843247 |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Beams (radiation) Condensed matter: structure, mechanical and thermal properties Depth profiling Electron, ion, and scanning probe microscopy Exact sciences and technology Magnesium oxide Nanocomposites Nanomaterials Nanostructure Physics Roughness Structure of solids and liquids crystallography Zinc oxide |
| title | Measuring the roughness of buried interfaces by sputter depth profiling |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T06%3A42%3A05IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Measuring%20the%20roughness%20of%20buried%20interfaces%20by%20sputter%20depth%20profiling&rft.jtitle=Nanotechnology&rft.au=Baryshev,%20S%20V&rft.aucorp=Argonne%20National%20Lab.%20(ANL),%20Argonne,%20IL%20(United%20States)&rft.date=2013-01-11&rft.volume=24&rft.issue=1&rft.spage=015708&rft.epage=015708&rft.pages=015708-015708&rft.issn=0957-4484&rft.eissn=1361-6528&rft.coden=NNOTER&rft_id=info:doi/10.1088/0957-4484/24/1/015708&rft_dat=%3Cproquest_pasca%3E1323216482%3C/proquest_pasca%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1239060472&rft_id=info:pmid/23221362&rfr_iscdi=true |