Synthesis and surface acoustic wave properties of AlN thin films fabricated on (001) and (110) sapphire substrates using chemical vapor deposition of AlCl3-NH3 system

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Bibliographische Detailangaben
Veröffentlicht in:	Japanese journal of applied physics 1997, Vol.36 (5A), p.2837-2842
Hauptverfasser:	KAYA, K, TAKABASHI, H, SHIBATA, Y, KANNO, Y, HIRAI, T
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Mechanical and acoustical properties adhesion Methods of deposition of films and coatings film growth and epitaxy Physics Solid surfaces and solid-solid interfaces Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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