Measurement of free radical kinetics in pulsed plasmas by UV and VUV absorption spectroscopy and by modulated beam mass spectrometry

This paper reviews recent progress in the development of time-resolved diagnostics to probe high-density pulsed plasma sources. We focus on time-resolved measurements of radicals' densities in the afterglow of pulsed discharges to provide useful information on production and loss mechanisms of...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Plasma sources science & technology 2012-04, Vol.21 (2), p.24006-1-9
Hauptverfasser:	Cunge, G, Bodart, P, Brihoum, M, Boulard, F, Chevolleau, T, Sadeghi, N
Format:	Artikel
Sprache:	eng
Schlagworte:	Absorption spectroscopy Afterglows Beams (radiation) Density Exact sciences and technology Free radicals Ionization of plasmas Mass spectrometry Optical (ultraviolet, visible, infrared) measurements Optics Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma diagnostic techniques and instrumentation Plasma Physics Plasma production and heating Plasma properties Plasma sources Plasmas Radicals
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!