Measurement of free radical kinetics in pulsed plasmas by UV and VUV absorption spectroscopy and by modulated beam mass spectrometry
This paper reviews recent progress in the development of time-resolved diagnostics to probe high-density pulsed plasma sources. We focus on time-resolved measurements of radicals' densities in the afterglow of pulsed discharges to provide useful information on production and loss mechanisms of...
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| Veröffentlicht in: | Plasma sources science & technology 2012-04, Vol.21 (2), p.24006-1-9 |
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| container_title | Plasma sources science & technology |
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| creator | Cunge, G Bodart, P Brihoum, M Boulard, F Chevolleau, T Sadeghi, N |
| description | This paper reviews recent progress in the development of time-resolved diagnostics to probe high-density pulsed plasma sources. We focus on time-resolved measurements of radicals' densities in the afterglow of pulsed discharges to provide useful information on production and loss mechanisms of free radicals. We show that broad-band absorption spectroscopy in the ultraviolet and vacuum ultraviolet spectral domain and threshold ionization modulated beam mass spectrometry are powerful techniques for the determination of the time variation of the radicals' densities in pulsed plasmas. The combination of these complementary techniques allows detection of most of the reactive species present in industrial etching plasmas, giving insights into the physico-chemistry reactions involving these species. As an example, we discuss briefly the radicals' kinetics in the afterglow of a SiCl4/Cl2/Ar discharge. |
| doi_str_mv | 10.1088/0963-0252/21/2/024006 |
| format | Article |
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| ispartof | Plasma sources science & technology, 2012-04, Vol.21 (2), p.24006-1-9 |
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| source | Institute of Physics Journals |
| subjects | Absorption spectroscopy Afterglows Beams (radiation) Density Exact sciences and technology Free radicals Ionization of plasmas Mass spectrometry Optical (ultraviolet, visible, infrared) measurements Optics Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma diagnostic techniques and instrumentation Plasma Physics Plasma production and heating Plasma properties Plasma sources Plasmas Radicals |
| title | Measurement of free radical kinetics in pulsed plasmas by UV and VUV absorption spectroscopy and by modulated beam mass spectrometry |
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