Preparation and properties of Mg0.2Zn0.8O:Al UV transparent conducting thin films deposited by RF magnetron sputtering at room temperature with rapid annealing : Zinc oxide
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| Veröffentlicht in: | Journal of materials science. Materials in electronics 2012, Vol.23 (2), p.403-407 |
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| container_end_page | 407 |
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| container_issue | 2 |
| container_start_page | 403 |
| container_title | Journal of materials science. Materials in electronics |
| container_volume | 23 |
| creator | HUA WANG ZHU HUANG XU, Ji-Wen LING YANG ZHOU, Shang-Ju |
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| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0957-4522 |
| ispartof | Journal of materials science. Materials in electronics, 2012, Vol.23 (2), p.403-407 |
| issn | 0957-4522 1573-482X |
| language | eng |
| recordid | cdi_pascalfrancis_primary_25579467 |
| source | SpringerLink Journals |
| subjects | Annealing Applied sciences Cold working, work hardening annealing, quenching, tempering, recovery, and recrystallization textures Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Heat treatment Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of bulk materials and thin films Physics Production techniques Treatment of materials and its effects on microstructure and properties |
| title | Preparation and properties of Mg0.2Zn0.8O:Al UV transparent conducting thin films deposited by RF magnetron sputtering at room temperature with rapid annealing : Zinc oxide |
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