A comparative study of the microstructure-dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach

SrTiO3 (STO) films were grown by atomic layer deposition (ALD) on TiN using Sr(t‐Bu3Cp)2, Ti(OCH3)4 and H2O. After crystallization anneal, large single crystals grains were obtained and nanocracks were present. The microstructure can be changed using a thin STO crystalline seed spike annealed at 700...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Physica status solidi. A, Applications and materials science Applications and materials science, 2011-08, Vol.208 (8), p.1920-1924
Hauptverfasser:	Popovici, Mihaela, Tomida, Kazuyuki, Swerts, Johan, Favia, Paola, Delabie, Annelies, Bender, Hugo, Adelmann, Christoph, Tielens, Hilde, Brijs, Bert, Kaczer, Ben, Pawlak, Malgorzata A., Kim, Min-Soo, Altimime, Laith, Van Elshocht, Sven, Kittl, Jorge A.
Format:	Artikel
Sprache:	eng
Schlagworte:	atomic layer deposition Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology dielectric properties Dielectric thin films Dielectrics, piezoelectrics, and ferroelectrics and their properties Exact sciences and technology high-k dielectrics Materials science metal-insulator-metal capacitors Methods of deposition of films and coatings film growth and epitaxy microstructure Physics SrTiO3 Vapor phase epitaxy growth from vapor phase
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!