Tailored ion energy distributions at an rf-biased plasma electrode

Tailored ion energy distributions at an rf-biased plasma electrode

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Veröffentlicht in:Plasma sources science & technology 2010-12, Vol.19 (6), p.065014
Hauptverfasser: Qin, X V, Ting, Y-H, Wendt, A E
Format: Artikel
Sprache:eng
Schlagworte:
Etching and cleaning
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
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Wendt, A E
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Etching and cleaning
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
title Tailored ion energy distributions at an rf-biased plasma electrode
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