Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy

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Veröffentlicht in:	Plasma sources science & technology 1998-08, Vol.7 (3), p.423-430
Hauptverfasser:	Booth, Jean-Paul, Cunge, Gilles, Neuilly, François, Sadeghi, Nader
Format:	Artikel
Sprache:	eng
Schlagworte:	Analytical chemistry Chemical analysis and related physical methods of analysis Chemistry Exact sciences and technology Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma properties Spectrometric and optical methods
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doi_str_mv	10.1088/0963-0252/7/3/021
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source	IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects	Analytical chemistry Chemical analysis and related physical methods of analysis Chemistry Exact sciences and technology Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma properties Spectrometric and optical methods
title	Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy
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