Selective area crystallization of amorphous silicon using micro-patterned Si02 capping layer
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| Veröffentlicht in: | Journal of crystal growth 2010, Vol.312 (16-17), p.2335-2338 |
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| container_end_page | 2338 |
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| container_issue | 16-17 |
| container_start_page | 2335 |
| container_title | Journal of crystal growth |
| container_volume | 312 |
| creator | DO KYUNG KIM WOONG HEE JEONG JUNG HYEON BAE TAE HYUNG HWANG NAM SEOK ROH HYUN JAE KIM |
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| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0022-0248 |
| ispartof | Journal of crystal growth, 2010, Vol.312 (16-17), p.2335-2338 |
| issn | 0022-0248 1873-5002 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_23014203 |
| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Equations of state, phase equilibria, and phase transitions Exact sciences and technology Materials science Nanoscale materials and structures: fabrication and characterization Other topics in nanoscale materials and structures Physics Solid-solid transitions Specific phase transitions Structure and morphology thickness Structure of solids and liquids crystallography Structure of specific crystalline solids Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology |
| title | Selective area crystallization of amorphous silicon using micro-patterned Si02 capping layer |
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