High Quality SiO2-like Layers by Large Area Atmospheric Pressure Plasma Enhanced CVD: Deposition Process Studies by Surface Analysis
This work reports on the main competing processes and their contribution to the properties of SiO2 layers on polymers in large area AP‐PE‐CVD from ArN2O2‐HMDSO mixtures. The detailed space resolved surface analysis on the statically deposited films showed smooth SiOx films in the vicinity of the g...
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Veröffentlicht in: | Plasma processes and polymers 2009-10, Vol.6 (10), p.693-702 |
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Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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