Effect of the reactor surface roughness on benzene oxidation in dielectric barrier discharges
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Veröffentlicht in: | Plasma sources science & technology 2008-11, Vol.17 (4), p.045015 |
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container_issue | 4 |
container_start_page | 045015 |
container_title | Plasma sources science & technology |
container_volume | 17 |
creator | Li, Jing Han, Shi-Tong Bai, Shu-Pei Shi, Xi-Cheng Han, Su-Ling Song, Hua Zhu, Xi-Ming Chen, Wen-Cong Pu, Yi-Kang |
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doi_str_mv | 10.1088/0963-0252/17/4/045015 |
format | Article |
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source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
subjects | Electric discharges Exact sciences and technology Other gas discharges Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges |
title | Effect of the reactor surface roughness on benzene oxidation in dielectric barrier discharges |
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