Microstructural and magnetic properties of thermally mixed Ni/Si bilayers

Polycrystalline nickel layers, deposited on Si(1 1 0) wafers via electron beam evaporation to a thickness of 29 or 68-70 nm, were thermally annealed in vacuo at 493 or 530 K. The elemental interdiffusion across the Ni/Si interface was measured by means of Rutherford backscattering spectroscopy, and...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of physics. D, Applied physics Applied physics, 2008-05, Vol.41 (9), p.095003-095003 (6)
Hauptverfasser:	Zhang, K, Lieb, K P, Bibić, N, Pilet, N, Ashworth, T V, Marioni, M A, Hug, H J
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Exact sciences and technology Interfacial magnetic properties (multilayers, magnetic quantum wells, superlattices, magnetic heterostructures) Magnetic properties and materials Magnetic properties of surface, thin films and multilayers Physics
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!