Epitaxial growth of Al on (NH4)2Sx-treated GaAs
Gespeichert in:
Veröffentlicht in: | Japanese journal of applied physics 1990-04, Vol.29 (4), p.L544-L547 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | L547 |
---|---|
container_issue | 4 |
container_start_page | L544 |
container_title | Japanese journal of applied physics |
container_volume | 29 |
creator | OIGAWA, H JIA-FA FAN NANNICHI, Y KAWABE, M |
description | |
doi_str_mv | 10.1143/jjap.29.l544 |
format | Article |
fullrecord | <record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_19820112</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>19820112</sourcerecordid><originalsourceid>FETCH-LOGICAL-j278t-54991cda9f9e0172b44c08e62fa1112131effdbd8a202be76ebf44d0bb02b8983</originalsourceid><addsrcrecordid>eNotzEFLwzAUwPEgCtbpzQ-Qi6CHdHmvr21yHGNuwtCDeh4vbaItdS1NwfntLejpz-_yF-IWdApA2bJteUjRpl1OdCYSyKhUpIv8XCRaIyiyiJfiKsZ2ZpETJGK5GZqJTw138mPsv6dP2Qe56mR_lPfPO3rA15OaRs-Tr-WWV_FaXATuor_570K8P27e1ju1f9k-rVd71WJpJpWTtVDVbIP1Gkp0RJU2vsDAAICQgQ-hdrVh1Oh8WXgXiGrt3ExjTbYQd3_fgWPFXRj5WDXxMIzNF48_B7AG9TzKfgGtKERP</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Epitaxial growth of Al on (NH4)2Sx-treated GaAs</title><source>Institute of Physics Journals</source><creator>OIGAWA, H ; JIA-FA FAN ; NANNICHI, Y ; KAWABE, M</creator><creatorcontrib>OIGAWA, H ; JIA-FA FAN ; NANNICHI, Y ; KAWABE, M</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.29.l544</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Physics ; Solid surfaces and solid-solid interfaces ; Surface and interface dynamics and vibrations ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film structure and morphology</subject><ispartof>Japanese journal of applied physics, 1990-04, Vol.29 (4), p.L544-L547</ispartof><rights>1991 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19820112$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>OIGAWA, H</creatorcontrib><creatorcontrib>JIA-FA FAN</creatorcontrib><creatorcontrib>NANNICHI, Y</creatorcontrib><creatorcontrib>KAWABE, M</creatorcontrib><title>Epitaxial growth of Al on (NH4)2Sx-treated GaAs</title><title>Japanese journal of applied physics</title><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Physics</subject><subject>Solid surfaces and solid-solid interfaces</subject><subject>Surface and interface dynamics and vibrations</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film structure and morphology</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1990</creationdate><recordtype>article</recordtype><recordid>eNotzEFLwzAUwPEgCtbpzQ-Qi6CHdHmvr21yHGNuwtCDeh4vbaItdS1NwfntLejpz-_yF-IWdApA2bJteUjRpl1OdCYSyKhUpIv8XCRaIyiyiJfiKsZ2ZpETJGK5GZqJTw138mPsv6dP2Qe56mR_lPfPO3rA15OaRs-Tr-WWV_FaXATuor_570K8P27e1ju1f9k-rVd71WJpJpWTtVDVbIP1Gkp0RJU2vsDAAICQgQ-hdrVh1Oh8WXgXiGrt3ExjTbYQd3_fgWPFXRj5WDXxMIzNF48_B7AG9TzKfgGtKERP</recordid><startdate>19900401</startdate><enddate>19900401</enddate><creator>OIGAWA, H</creator><creator>JIA-FA FAN</creator><creator>NANNICHI, Y</creator><creator>KAWABE, M</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope></search><sort><creationdate>19900401</creationdate><title>Epitaxial growth of Al on (NH4)2Sx-treated GaAs</title><author>OIGAWA, H ; JIA-FA FAN ; NANNICHI, Y ; KAWABE, M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-j278t-54991cda9f9e0172b44c08e62fa1112131effdbd8a202be76ebf44d0bb02b8983</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1990</creationdate><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Physics</topic><topic>Solid surfaces and solid-solid interfaces</topic><topic>Surface and interface dynamics and vibrations</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>OIGAWA, H</creatorcontrib><creatorcontrib>JIA-FA FAN</creatorcontrib><creatorcontrib>NANNICHI, Y</creatorcontrib><creatorcontrib>KAWABE, M</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Japanese journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>OIGAWA, H</au><au>JIA-FA FAN</au><au>NANNICHI, Y</au><au>KAWABE, M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Epitaxial growth of Al on (NH4)2Sx-treated GaAs</atitle><jtitle>Japanese journal of applied physics</jtitle><date>1990-04-01</date><risdate>1990</risdate><volume>29</volume><issue>4</issue><spage>L544</spage><epage>L547</epage><pages>L544-L547</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.29.l544</doi></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-4922 |
ispartof | Japanese journal of applied physics, 1990-04, Vol.29 (4), p.L544-L547 |
issn | 0021-4922 1347-4065 |
language | eng |
recordid | cdi_pascalfrancis_primary_19820112 |
source | Institute of Physics Journals |
subjects | Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid surfaces and solid-solid interfaces Surface and interface dynamics and vibrations Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology |
title | Epitaxial growth of Al on (NH4)2Sx-treated GaAs |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-02T04%3A45%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Epitaxial%20growth%20of%20Al%20on%20(NH4)2Sx-treated%20GaAs&rft.jtitle=Japanese%20journal%20of%20applied%20physics&rft.au=OIGAWA,%20H&rft.date=1990-04-01&rft.volume=29&rft.issue=4&rft.spage=L544&rft.epage=L547&rft.pages=L544-L547&rft.issn=0021-4922&rft.eissn=1347-4065&rft.coden=JJAPA5&rft_id=info:doi/10.1143/jjap.29.l544&rft_dat=%3Cpascalfrancis%3E19820112%3C/pascalfrancis%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |