Epitaxial growth of Al on (NH4)2Sx-treated GaAs

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Veröffentlicht in:Japanese journal of applied physics 1990-04, Vol.29 (4), p.L544-L547
Hauptverfasser: OIGAWA, H, JIA-FA FAN, NANNICHI, Y, KAWABE, M
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container_end_page L547
container_issue 4
container_start_page L544
container_title Japanese journal of applied physics
container_volume 29
creator OIGAWA, H
JIA-FA FAN
NANNICHI, Y
KAWABE, M
description
doi_str_mv 10.1143/jjap.29.l544
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ispartof Japanese journal of applied physics, 1990-04, Vol.29 (4), p.L544-L547
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source Institute of Physics Journals
subjects Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Solid surfaces and solid-solid interfaces
Surface and interface dynamics and vibrations
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
title Epitaxial growth of Al on (NH4)2Sx-treated GaAs
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