Si Ge alloys: growth, properties and applications

Due to advances in epitaxial techniques, the ability to deposit high-quality epitaxial silicon-germanium alloys at lower temperature, has opened up the applications of pseudomorphicSi 1−xGe x films in advanced bipolar transistors and in novel device structures. In this review paper, the various meth...

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Veröffentlicht in:	Applied surface science 1991-05, Vol.48, p.377-386
Hauptverfasser:	Arienzo, Maurizio, Iyer, Subramanian S., Meyerson, Bernard S., Patton, Gary L., Stork, Johannes M.C.
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid surfaces and solid-solid interfaces Surface and interface dynamics and vibrations Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
Online-Zugang:	Volltext
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