Theoretical simulation of physical processes in a discharge XeCl laser

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Veröffentlicht in:Journal of physics. B, Atomic, molecular, and optical physics Atomic, molecular, and optical physics, 1989-05, Vol.22 (9), p.1489-1504
Hauptverfasser: Mihkelsoo, V, Miidla, P, Peet, V, Sherman, A, Sorkina, R, Tamme, E, Treshchalov, A
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container_end_page 1504
container_issue 9
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container_title Journal of physics. B, Atomic, molecular, and optical physics
container_volume 22
creator Mihkelsoo, V
Miidla, P
Peet, V
Sherman, A
Sorkina, R
Tamme, E
Treshchalov, A
description
doi_str_mv 10.1088/0953-4075/22/9/020
format Article
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ispartof Journal of physics. B, Atomic, molecular, and optical physics, 1989-05, Vol.22 (9), p.1489-1504
issn 0953-4075
1361-6455
language eng
recordid cdi_pascalfrancis_primary_19702118
source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Gas lasers including excimer and metal-vapor lasers
Lasers
Optics
Physics
title Theoretical simulation of physical processes in a discharge XeCl laser
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