Sub-5 nm FIB direct patterning of nanodevices

Nanoengraving of membranes as a template for nanopores fabrication is an application field of growing interest. Similarly to the formation of ion tracks in membranes created when high-energetic ions pass trough thin foils, it is possible with a FIB system to fabricate, design and organise nanodevice...

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Veröffentlicht in:Microelectronic engineering 2007-05, Vol.84 (5), p.779-783
Hauptverfasser: Gierak, J., Madouri, A., Biance, A.L., Bourhis, E., Patriarche, G., Ulysse, C., Lucot, D., Lafosse, X., Auvray, L., Bruchhaus, L., Jede, R.
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Sprache:eng
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Zusammenfassung:Nanoengraving of membranes as a template for nanopores fabrication is an application field of growing interest. Similarly to the formation of ion tracks in membranes created when high-energetic ions pass trough thin foils, it is possible with a FIB system to fabricate, design and organise nanodevices within thin membranes. In this work, we detail the advanced methodology we have carefully optimised for such deep sub-10 nm nanodevices fabrication using our high-performance FIB instrument.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2007.01.059