The influence of ion bombardment intensity during deposition on nickel films microstructure
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| creator | POPOVIC, N BOGDANOV, Z GONCIC, B ZEC, S RAKOCEVIC, Z |
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| fulltext | fulltext |
| identifier | ISSN: 0040-6090 |
| ispartof | Thin solid films, 1999, Vol.343-4, p.75-80 |
| issn | 0040-6090 1879-2731 |
| language | eng |
| recordid | cdi_pascalfrancis_primary_1868579 |
| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Ion and electron beam-assisted deposition ion plating Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology |
| title | The influence of ion bombardment intensity during deposition on nickel films microstructure |
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