Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering

In this work TiOx (x > 1.8) films are grown reactively from a ceramic TiO1.8 target employing high power pulsed magnetron sputtering (HPPMS) at a constant average target current. The effect of the pulse on/off time configuration on the target and the discharge characteristics as well as on the fi...

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Veröffentlicht in:	Journal of physics. D, Applied physics Applied physics, 2007-04, Vol.40 (7), p.2108-2114
Hauptverfasser:	Sarakinos, K, Alami, J, Wuttig, M
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Insulators Materials science Methods of deposition of films and coatings film growth and epitaxy Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics TECHNOLOGY TEKNIKVETENSKAP
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