The predicted influence of polar dielectric insulators on the channel mobility of amorphous organic field-effect transistors

The channel mobility in organic field-effect transistors that have a disordered semi-conducting layer in contact with an insulating polar dielectric material is calculated from the transconductance of the modelled transistor transfer response. The modelled transfer characteristics incorporate the ad...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of physics. D, Applied physics Applied physics, 2007-02, Vol.40 (4), p.982-989
Hauptverfasser: Goldie, D M, Dines, T J
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 989
container_issue 4
container_start_page 982
container_title Journal of physics. D, Applied physics
container_volume 40
creator Goldie, D M
Dines, T J
description The channel mobility in organic field-effect transistors that have a disordered semi-conducting layer in contact with an insulating polar dielectric material is calculated from the transconductance of the modelled transistor transfer response. The modelled transfer characteristics incorporate the additional energetic disorder that is introduced into the channel region from the polar gate dielectric, together with a carrier mobility enhancement factor due to localized state occupancy under charge accumulation conditions. A proposed mobility enhancement factor is independently determined from Monte Carlo simulations of carrier hopping through partially occupied energy landscapes that are subject to a Gaussian distribution of energetic disorder. The calculated field-effect mobility is found to be reduced relative to the bulk semiconductor mobility as the amount of energetic disorder in the channel region is increased through the use of more strongly polar gate dielectrics. The field-effect mobility is additionally found to decrease as the accumulated charge is confined to the most energetically disordered region in the vicinity of the insulator-semiconductor interface at higher gate voltages. The overall gate voltage dependence of the channel mobility is suppressed, however, by the mobility enhancement factor. Support for the model is found from recently published mobility data for a series of triarylamine field-effect devices.
doi_str_mv 10.1088/0022-3727/40/4/010
format Article
fullrecord <record><control><sourceid>proquest_pasca</sourceid><recordid>TN_cdi_pascalfrancis_primary_18521263</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>29708594</sourcerecordid><originalsourceid>FETCH-LOGICAL-c446t-6de4dd1e45900611922add829385c6126f1fb4491a5a54521f11f13b79c6f3fd3</originalsourceid><addsrcrecordid>eNqNkMtKAzEUhoMoWKsv4CobBRfj5DaZmaUUb1BwU9chzcVG0smYzCwKPrwZWnTRjXAgi_P9Hyc_ANcY3WPUNCVChBS0JnXJUMlKhNEJmGHKccEZp6dg9gucg4uUPhFCFW_wDHyvNgb20WinBqOh66wfTacMDBb2wcsItTPeqCE6lbdp9HIIMcHQwSEn1UZ2nfFwG9bOu2E3xeQ2xH4TxgzFD9nlnM0KXRhrswcOUXbJpclyCc6s9MlcHd45eH96XC1eiuXb8-viYVkoxvhQcG2Y1tiwqkWIY9wSIrVuSEubSnFMuMV2zViLZSUrVhFscR66rlvFLbWazsHt3tvH8DWaNIitS8p4LzuT7xSkrVFTtSyDZA-qGFKKxoo-uq2MO4GRmIoWU49i6lEwJJjIRefQzcEuk5Le5v8pl_6STb6IcJq5Ys-50P_Pe3fMH3Oi15b-AEjTmd4</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>29708594</pqid></control><display><type>article</type><title>The predicted influence of polar dielectric insulators on the channel mobility of amorphous organic field-effect transistors</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Goldie, D M ; Dines, T J</creator><creatorcontrib>Goldie, D M ; Dines, T J</creatorcontrib><description>The channel mobility in organic field-effect transistors that have a disordered semi-conducting layer in contact with an insulating polar dielectric material is calculated from the transconductance of the modelled transistor transfer response. The modelled transfer characteristics incorporate the additional energetic disorder that is introduced into the channel region from the polar gate dielectric, together with a carrier mobility enhancement factor due to localized state occupancy under charge accumulation conditions. A proposed mobility enhancement factor is independently determined from Monte Carlo simulations of carrier hopping through partially occupied energy landscapes that are subject to a Gaussian distribution of energetic disorder. The calculated field-effect mobility is found to be reduced relative to the bulk semiconductor mobility as the amount of energetic disorder in the channel region is increased through the use of more strongly polar gate dielectrics. The field-effect mobility is additionally found to decrease as the accumulated charge is confined to the most energetically disordered region in the vicinity of the insulator-semiconductor interface at higher gate voltages. The overall gate voltage dependence of the channel mobility is suppressed, however, by the mobility enhancement factor. Support for the model is found from recently published mobility data for a series of triarylamine field-effect devices.</description><identifier>ISSN: 0022-3727</identifier><identifier>EISSN: 1361-6463</identifier><identifier>DOI: 10.1088/0022-3727/40/4/010</identifier><identifier>CODEN: JPAPBE</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; Interfaces ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Transistors</subject><ispartof>Journal of physics. D, Applied physics, 2007-02, Vol.40 (4), p.982-989</ispartof><rights>2007 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c446t-6de4dd1e45900611922add829385c6126f1fb4491a5a54521f11f13b79c6f3fd3</citedby><cites>FETCH-LOGICAL-c446t-6de4dd1e45900611922add829385c6126f1fb4491a5a54521f11f13b79c6f3fd3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/0022-3727/40/4/010/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,776,780,27901,27902,53805,53885</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=18521263$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Goldie, D M</creatorcontrib><creatorcontrib>Dines, T J</creatorcontrib><title>The predicted influence of polar dielectric insulators on the channel mobility of amorphous organic field-effect transistors</title><title>Journal of physics. D, Applied physics</title><description>The channel mobility in organic field-effect transistors that have a disordered semi-conducting layer in contact with an insulating polar dielectric material is calculated from the transconductance of the modelled transistor transfer response. The modelled transfer characteristics incorporate the additional energetic disorder that is introduced into the channel region from the polar gate dielectric, together with a carrier mobility enhancement factor due to localized state occupancy under charge accumulation conditions. A proposed mobility enhancement factor is independently determined from Monte Carlo simulations of carrier hopping through partially occupied energy landscapes that are subject to a Gaussian distribution of energetic disorder. The calculated field-effect mobility is found to be reduced relative to the bulk semiconductor mobility as the amount of energetic disorder in the channel region is increased through the use of more strongly polar gate dielectrics. The field-effect mobility is additionally found to decrease as the accumulated charge is confined to the most energetically disordered region in the vicinity of the insulator-semiconductor interface at higher gate voltages. The overall gate voltage dependence of the channel mobility is suppressed, however, by the mobility enhancement factor. Support for the model is found from recently published mobility data for a series of triarylamine field-effect devices.</description><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Interfaces</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Transistors</subject><issn>0022-3727</issn><issn>1361-6463</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNqNkMtKAzEUhoMoWKsv4CobBRfj5DaZmaUUb1BwU9chzcVG0smYzCwKPrwZWnTRjXAgi_P9Hyc_ANcY3WPUNCVChBS0JnXJUMlKhNEJmGHKccEZp6dg9gucg4uUPhFCFW_wDHyvNgb20WinBqOh66wfTacMDBb2wcsItTPeqCE6lbdp9HIIMcHQwSEn1UZ2nfFwG9bOu2E3xeQ2xH4TxgzFD9nlnM0KXRhrswcOUXbJpclyCc6s9MlcHd45eH96XC1eiuXb8-viYVkoxvhQcG2Y1tiwqkWIY9wSIrVuSEubSnFMuMV2zViLZSUrVhFscR66rlvFLbWazsHt3tvH8DWaNIitS8p4LzuT7xSkrVFTtSyDZA-qGFKKxoo-uq2MO4GRmIoWU49i6lEwJJjIRefQzcEuk5Le5v8pl_6STb6IcJq5Ys-50P_Pe3fMH3Oi15b-AEjTmd4</recordid><startdate>20070221</startdate><enddate>20070221</enddate><creator>Goldie, D M</creator><creator>Dines, T J</creator><general>IOP Publishing</general><general>Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20070221</creationdate><title>The predicted influence of polar dielectric insulators on the channel mobility of amorphous organic field-effect transistors</title><author>Goldie, D M ; Dines, T J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c446t-6de4dd1e45900611922add829385c6126f1fb4491a5a54521f11f13b79c6f3fd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Interfaces</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Goldie, D M</creatorcontrib><creatorcontrib>Dines, T J</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of physics. D, Applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Goldie, D M</au><au>Dines, T J</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The predicted influence of polar dielectric insulators on the channel mobility of amorphous organic field-effect transistors</atitle><jtitle>Journal of physics. D, Applied physics</jtitle><date>2007-02-21</date><risdate>2007</risdate><volume>40</volume><issue>4</issue><spage>982</spage><epage>989</epage><pages>982-989</pages><issn>0022-3727</issn><eissn>1361-6463</eissn><coden>JPAPBE</coden><abstract>The channel mobility in organic field-effect transistors that have a disordered semi-conducting layer in contact with an insulating polar dielectric material is calculated from the transconductance of the modelled transistor transfer response. The modelled transfer characteristics incorporate the additional energetic disorder that is introduced into the channel region from the polar gate dielectric, together with a carrier mobility enhancement factor due to localized state occupancy under charge accumulation conditions. A proposed mobility enhancement factor is independently determined from Monte Carlo simulations of carrier hopping through partially occupied energy landscapes that are subject to a Gaussian distribution of energetic disorder. The calculated field-effect mobility is found to be reduced relative to the bulk semiconductor mobility as the amount of energetic disorder in the channel region is increased through the use of more strongly polar gate dielectrics. The field-effect mobility is additionally found to decrease as the accumulated charge is confined to the most energetically disordered region in the vicinity of the insulator-semiconductor interface at higher gate voltages. The overall gate voltage dependence of the channel mobility is suppressed, however, by the mobility enhancement factor. Support for the model is found from recently published mobility data for a series of triarylamine field-effect devices.</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><doi>10.1088/0022-3727/40/4/010</doi><tpages>8</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0022-3727
ispartof Journal of physics. D, Applied physics, 2007-02, Vol.40 (4), p.982-989
issn 0022-3727
1361-6463
language eng
recordid cdi_pascalfrancis_primary_18521263
source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects Applied sciences
Electronics
Exact sciences and technology
Interfaces
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
title The predicted influence of polar dielectric insulators on the channel mobility of amorphous organic field-effect transistors
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-05T02%3A20%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=The%20predicted%20influence%20of%20polar%20dielectric%20insulators%20on%20the%20channel%20mobility%20of%20amorphous%20organic%20field-effect%20transistors&rft.jtitle=Journal%20of%20physics.%20D,%20Applied%20physics&rft.au=Goldie,%20D%20M&rft.date=2007-02-21&rft.volume=40&rft.issue=4&rft.spage=982&rft.epage=989&rft.pages=982-989&rft.issn=0022-3727&rft.eissn=1361-6463&rft.coden=JPAPBE&rft_id=info:doi/10.1088/0022-3727/40/4/010&rft_dat=%3Cproquest_pasca%3E29708594%3C/proquest_pasca%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=29708594&rft_id=info:pmid/&rfr_iscdi=true