FSS array generation by optical means

We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasm...

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Bibliographische Detailangaben
Hauptverfasser: Lockyer, D.S, Vardaxoglou, J.C, Kearney, M.J
Format: Tagungsbericht
Sprache:eng
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