FSS array generation by optical means

We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasm...

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Hauptverfasser: Lockyer, D.S, Vardaxoglou, J.C, Kearney, M.J
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creator Lockyer, D.S
Vardaxoglou, J.C
Kearney, M.J
description We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.
doi_str_mv 10.1049/cp:19990034
format Conference Proceeding
fullrecord <record><control><sourceid>iet_pasca</sourceid><recordid>TN_cdi_pascalfrancis_primary_1821452</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1049_cp_19990034</sourcerecordid><originalsourceid>FETCH-LOGICAL-i217t-a5ca87968fc43e9c94dc50d7a32f1b858f99eae07f771c7c9ee3a8d2496d36273</originalsourceid><addsrcrecordid>eNo1kE1LAzEURQMqWGtX_oFZ6EYYzeckz52UVoWCi-o6vGZeZKTNDMls5t9bqd7N3RzuhcPYjeAPgmt4DMOTAADOlT5jV9wZCY0VqjlnM26UrQEcXLJFKd_8GG2E5c2M3a232wpzxqn6okQZx65P1W6q-mHsAu6rA2Eq1-wi4r7Q4q_n7HO9-li-1pv3l7fl86bupLBjjSags9C4GLQiCKDbYHhrUckods64CEBI3EZrRbABiBS6VmpoWtVIq-bs9rQ7YDmex4wpdMUPuTtgnrxwUmgjj9j9Ceto9KFPkTKlQMUL7n9d-DD4fxfqB0rlT24</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>FSS array generation by optical means</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Lockyer, D.S ; Vardaxoglou, J.C ; Kearney, M.J</creator><creatorcontrib>Lockyer, D.S ; Vardaxoglou, J.C ; Kearney, M.J</creatorcontrib><description>We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.</description><identifier>ISSN: 0537-9989</identifier><identifier>ISBN: 0852967136</identifier><identifier>ISBN: 9780852967133</identifier><identifier>DOI: 10.1049/cp:19990034</identifier><identifier>CODEN: IECPB4</identifier><language>eng</language><publisher>London: IEE</publisher><subject>Antenna arrays ; Antennas ; Applied sciences ; Electronics ; Exact sciences and technology ; Lithography (semiconductor technology) ; Microelectronic fabrication (materials and surfaces technology) ; Radiocommunications ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Telecommunications ; Telecommunications and information theory</subject><ispartof>IEE National Conference on Antennas and Propagation, 1999, p.132-135</ispartof><rights>1999 INIST-CNRS</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,776,780,785,786,4036,4037,27902</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=1821452$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Lockyer, D.S</creatorcontrib><creatorcontrib>Vardaxoglou, J.C</creatorcontrib><creatorcontrib>Kearney, M.J</creatorcontrib><title>FSS array generation by optical means</title><title>IEE National Conference on Antennas and Propagation</title><description>We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.</description><subject>Antenna arrays</subject><subject>Antennas</subject><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Lithography (semiconductor technology)</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Radiocommunications</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Telecommunications</subject><subject>Telecommunications and information theory</subject><issn>0537-9989</issn><isbn>0852967136</isbn><isbn>9780852967133</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1999</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNo1kE1LAzEURQMqWGtX_oFZ6EYYzeckz52UVoWCi-o6vGZeZKTNDMls5t9bqd7N3RzuhcPYjeAPgmt4DMOTAADOlT5jV9wZCY0VqjlnM26UrQEcXLJFKd_8GG2E5c2M3a232wpzxqn6okQZx65P1W6q-mHsAu6rA2Eq1-wi4r7Q4q_n7HO9-li-1pv3l7fl86bupLBjjSags9C4GLQiCKDbYHhrUckods64CEBI3EZrRbABiBS6VmpoWtVIq-bs9rQ7YDmex4wpdMUPuTtgnrxwUmgjj9j9Ceto9KFPkTKlQMUL7n9d-DD4fxfqB0rlT24</recordid><startdate>1999</startdate><enddate>1999</enddate><creator>Lockyer, D.S</creator><creator>Vardaxoglou, J.C</creator><creator>Kearney, M.J</creator><general>IEE</general><scope>8ET</scope><scope>IQODW</scope></search><sort><creationdate>1999</creationdate><title>FSS array generation by optical means</title><author>Lockyer, D.S ; Vardaxoglou, J.C ; Kearney, M.J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i217t-a5ca87968fc43e9c94dc50d7a32f1b858f99eae07f771c7c9ee3a8d2496d36273</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1999</creationdate><topic>Antenna arrays</topic><topic>Antennas</topic><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Lithography (semiconductor technology)</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Radiocommunications</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Telecommunications</topic><topic>Telecommunications and information theory</topic><toplevel>online_resources</toplevel><creatorcontrib>Lockyer, D.S</creatorcontrib><creatorcontrib>Vardaxoglou, J.C</creatorcontrib><creatorcontrib>Kearney, M.J</creatorcontrib><collection>IET Conference Publications by volume</collection><collection>Pascal-Francis</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lockyer, D.S</au><au>Vardaxoglou, J.C</au><au>Kearney, M.J</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>FSS array generation by optical means</atitle><btitle>IEE National Conference on Antennas and Propagation</btitle><date>1999</date><risdate>1999</risdate><spage>132</spage><epage>135</epage><pages>132-135</pages><issn>0537-9989</issn><isbn>0852967136</isbn><isbn>9780852967133</isbn><coden>IECPB4</coden><abstract>We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.</abstract><cop>London</cop><pub>IEE</pub><doi>10.1049/cp:19990034</doi><tpages>4</tpages></addata></record>
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identifier ISSN: 0537-9989
ispartof IEE National Conference on Antennas and Propagation, 1999, p.132-135
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Antenna arrays
Antennas
Applied sciences
Electronics
Exact sciences and technology
Lithography (semiconductor technology)
Microelectronic fabrication (materials and surfaces technology)
Radiocommunications
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Telecommunications
Telecommunications and information theory
title FSS array generation by optical means
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T00%3A04%3A46IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iet_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=FSS%20array%20generation%20by%20optical%20means&rft.btitle=IEE%20National%20Conference%20on%20Antennas%20and%20Propagation&rft.au=Lockyer,%20D.S&rft.date=1999&rft.spage=132&rft.epage=135&rft.pages=132-135&rft.issn=0537-9989&rft.isbn=0852967136&rft.isbn_list=9780852967133&rft.coden=IECPB4&rft_id=info:doi/10.1049/cp:19990034&rft_dat=%3Ciet_pasca%3E10_1049_cp_19990034%3C/iet_pasca%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true