FSS array generation by optical means
We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasm...
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creator | Lockyer, D.S Vardaxoglou, J.C Kearney, M.J |
description | We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern. |
doi_str_mv | 10.1049/cp:19990034 |
format | Conference Proceeding |
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The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.</description><identifier>ISSN: 0537-9989</identifier><identifier>ISBN: 0852967136</identifier><identifier>ISBN: 9780852967133</identifier><identifier>DOI: 10.1049/cp:19990034</identifier><identifier>CODEN: IECPB4</identifier><language>eng</language><publisher>London: IEE</publisher><subject>Antenna arrays ; Antennas ; Applied sciences ; Electronics ; Exact sciences and technology ; Lithography (semiconductor technology) ; Microelectronic fabrication (materials and surfaces technology) ; Radiocommunications ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Telecommunications ; Telecommunications and information theory</subject><ispartof>IEE National Conference on Antennas and Propagation, 1999, p.132-135</ispartof><rights>1999 INIST-CNRS</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,776,780,785,786,4036,4037,27902</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1821452$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Lockyer, D.S</creatorcontrib><creatorcontrib>Vardaxoglou, J.C</creatorcontrib><creatorcontrib>Kearney, M.J</creatorcontrib><title>FSS array generation by optical means</title><title>IEE National Conference on Antennas and Propagation</title><description>We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.</description><subject>Antenna arrays</subject><subject>Antennas</subject><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Lithography (semiconductor technology)</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Radiocommunications</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Telecommunications</subject><subject>Telecommunications and information theory</subject><issn>0537-9989</issn><isbn>0852967136</isbn><isbn>9780852967133</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1999</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNo1kE1LAzEURQMqWGtX_oFZ6EYYzeckz52UVoWCi-o6vGZeZKTNDMls5t9bqd7N3RzuhcPYjeAPgmt4DMOTAADOlT5jV9wZCY0VqjlnM26UrQEcXLJFKd_8GG2E5c2M3a232wpzxqn6okQZx65P1W6q-mHsAu6rA2Eq1-wi4r7Q4q_n7HO9-li-1pv3l7fl86bupLBjjSags9C4GLQiCKDbYHhrUckods64CEBI3EZrRbABiBS6VmpoWtVIq-bs9rQ7YDmex4wpdMUPuTtgnrxwUmgjj9j9Ceto9KFPkTKlQMUL7n9d-DD4fxfqB0rlT24</recordid><startdate>1999</startdate><enddate>1999</enddate><creator>Lockyer, D.S</creator><creator>Vardaxoglou, J.C</creator><creator>Kearney, M.J</creator><general>IEE</general><scope>8ET</scope><scope>IQODW</scope></search><sort><creationdate>1999</creationdate><title>FSS array generation by optical means</title><author>Lockyer, D.S ; Vardaxoglou, J.C ; Kearney, M.J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i217t-a5ca87968fc43e9c94dc50d7a32f1b858f99eae07f771c7c9ee3a8d2496d36273</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1999</creationdate><topic>Antenna arrays</topic><topic>Antennas</topic><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Lithography (semiconductor technology)</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Radiocommunications</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Telecommunications</topic><topic>Telecommunications and information theory</topic><toplevel>online_resources</toplevel><creatorcontrib>Lockyer, D.S</creatorcontrib><creatorcontrib>Vardaxoglou, J.C</creatorcontrib><creatorcontrib>Kearney, M.J</creatorcontrib><collection>IET Conference Publications by volume</collection><collection>Pascal-Francis</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lockyer, D.S</au><au>Vardaxoglou, J.C</au><au>Kearney, M.J</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>FSS array generation by optical means</atitle><btitle>IEE National Conference on Antennas and Propagation</btitle><date>1999</date><risdate>1999</risdate><spage>132</spage><epage>135</epage><pages>132-135</pages><issn>0537-9989</issn><isbn>0852967136</isbn><isbn>9780852967133</isbn><coden>IECPB4</coden><abstract>We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.</abstract><cop>London</cop><pub>IEE</pub><doi>10.1049/cp:19990034</doi><tpages>4</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0537-9989 |
ispartof | IEE National Conference on Antennas and Propagation, 1999, p.132-135 |
issn | 0537-9989 |
language | eng |
recordid | cdi_pascalfrancis_primary_1821452 |
source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Antenna arrays Antennas Applied sciences Electronics Exact sciences and technology Lithography (semiconductor technology) Microelectronic fabrication (materials and surfaces technology) Radiocommunications Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Telecommunications Telecommunications and information theory |
title | FSS array generation by optical means |
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