Multidirectional UV Lithography for Complex 3-D MEMS Structures

Various three-dimensionally (3-D) complex MEMS structures are fabricated using multidirectional ultraviolet (UV) lithography, which includes reverse-side exposure through a UV-transparent substrate, inclined exposure with or without simultaneous substrate rotation, and the combination of these proce...

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Veröffentlicht in:	Journal of microelectromechanical systems 2006-10, Vol.15 (5), p.1121-1130
Hauptverfasser:	Yong-Kyu Yoon, Jung-Hwan Park, Allen, M.G.
Format:	Artikel
Sprache:	eng
Schlagworte:	Barium strontium titanates Binary search trees Dynamics Exact sciences and technology Glass Inclined exposure Instruments, apparatus, components and techniques common to several branches of physics and astronomy Integrated optics Lenses Lithography Mechanical instruments, equipment and techniques Metallization Metallizing Microelectromechanical systems Micromechanical devices Micromechanical devices and systems multidirectional ultraviolet (UV) lithography Optical refraction Optical variables control Patterning Physics Resists reverse-side exposure rotational exposure Sapphire SU-8 Ultraviolet
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