Isolating failure location by using a dynamic emission microscopy system -a specific IddQ fail case study
The purpose of this paper is to present a novel failure analysis application of a dynamic emission microscopy system, which is implemented by photoemission microscopy coupled with a logic tester and corresponding software. The system not only filtered out spurious hot spots that would mislead analys...
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| creator | SHEN, Cha-Ming CHEN, Chien-Hui |
| description | The purpose of this paper is to present a novel failure analysis application of a dynamic emission microscopy system, which is implemented by photoemission microscopy coupled with a logic tester and corresponding software. The system not only filtered out spurious hot spots that would mislead analysts, but also caught valid emission spots on the failure block when very faint photoemission was caused by a small defect at the specific IddQ state. PFA (physical failure analysis) results are also revealed to show the fault isolation located by the dynamic emission microscopy, showing that the system is successful. |
| doi_str_mv | 10.1109/IPFA.2004.1345634 |
| format | Conference Proceeding |
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| ispartof | Proceedings of the 11th International Symposium on the Physical and Failure Analysis of Integrated Circuits. IPFA 2004 (IEEE Cat. No.04TH8743), 2004, p.303-305 |
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| language | eng |
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| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Applied sciences Computer aided software engineering Current measurement Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Failure analysis Integrated circuits Logic testing Microscopy Phase measurement Photoelectricity Semiconductor device manufacture Semiconductor device measurement Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices System testing Testing, measurement, noise and reliability |
| title | Isolating failure location by using a dynamic emission microscopy system -a specific IddQ fail case study |
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