Atomic layer deposition of TiO2 and Al2O3thin films and nanolaminates
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| Veröffentlicht in: | Smart materials and structures 2006, Vol.15 (1), p.S57-S64 |
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| container_end_page | S64 |
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| container_issue | 1 |
| container_start_page | S57 |
| container_title | Smart materials and structures |
| container_volume | 15 |
| creator | MITCHELL, D. R. G TRIANI, G ATTARD, D. J FINNIE, K. S EVANS, P. J BARBE, C. J BARTLETT, J. R |
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| fulltext | fulltext |
| identifier | ISSN: 0964-1726 |
| ispartof | Smart materials and structures, 2006, Vol.15 (1), p.S57-S64 |
| issn | 0964-1726 1361-665X |
| language | eng |
| recordid | cdi_pascalfrancis_primary_17461953 |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
| title | Atomic layer deposition of TiO2 and Al2O3thin films and nanolaminates |
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