High performance SOI technology for sub-45nm gate length CMOS manufacturing

Bibliographische Detailangaben

Hauptverfasser:	HORSTMANN, M, GREENLAW, D, SCHWAN, C, PETERS, C, LENSKI, M, PRESS, P, KAMMLER, Th, BIERSTEDT, H, OTTERBACH, R, NEU, A, WIECZOREK, K, SCHALLER, M, HUEBLER, P, SALZ, H, HOHAGE, J, RUELKE, H, KLAIS, J, GRASSHOFF, G, EHRICHS, E, GOAD, S, RAAB, M, KEPLER, N, STEPHAN, R, FEUDEL, Th, WEI, A, FROHBERG, K, HOENTSCHEL, J, JAVORKA, P, BURBACH, G
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Applied sciences Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Integrated circuits Integrated circuits by function (including memories and processors) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transistors
Online-Zugang:	Volltext
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