Self-assembled monolayer-assisted thin metal polishing for fabricating uniform 3D microstructures

A self-assembled monolayer (SAM) was actively used to improve the reproducibility and yield of micromachining technology. A harsh metal mechanical polishing process was replaced with a metal wet etching process by using a hexadecanethiol (HDT) SAM as an etch-protect mask. The fundamental results of...

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Veröffentlicht in:Journal of micromechanics and microengineering 2005-05, Vol.15 (5), p.1027-1032
Hauptverfasser: Chang, Sung-Il, Choi, Yun-Seok, Yoon, Jun-Bo
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container_title Journal of micromechanics and microengineering
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creator Chang, Sung-Il
Choi, Yun-Seok
Yoon, Jun-Bo
description A self-assembled monolayer (SAM) was actively used to improve the reproducibility and yield of micromachining technology. A harsh metal mechanical polishing process was replaced with a metal wet etching process by using a hexadecanethiol (HDT) SAM as an etch-protect mask. The fundamental results of the experiment show the excellent ability of the HDT SAM in protecting the gold from the gold wet etchant and the wide process margin. The proposed process, which was used to fabricate a 3D suspended inductor, greatly improves the process yield. The proposed micromachining technology with a SAM is expected to have a variety of applications for the highly reproducible and uniform fabrication of MEMS.
doi_str_mv 10.1088/0960-1317/15/5/019
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subjects Applied sciences
Electronics
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Mechanical engineering. Machine design
Mechanical instruments, equipment and techniques
Microelectronic fabrication (materials and surfaces technology)
Micromechanical devices and systems
Physics
Precision engineering, watch making
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title Self-assembled monolayer-assisted thin metal polishing for fabricating uniform 3D microstructures
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