Scum-free patterning of SU-8 resist for electroforming applications

A simple approach is developed to obtain scum-free pattern transfer in SU-8 resist by UV-lithography for electroforming applications. SU-8 is an epoxy-based negative resist used in the fabrication of high-aspect ratio microstructures. SU-8 resist poses considerable processing difficulties and tends...

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Veröffentlicht in:Journal of micromechanics and microengineering 2005-01, Vol.15 (1), p.130-135
Hauptverfasser: Agarwal, M, Gunasekaran, R A, Coane, P, Varahramyan, K
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Sprache:eng
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