Photo-induced atomic layer deposition of tantalum oxide thin films from Ta(OC2H5)5 and O2

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Veröffentlicht in:	Journal of the Electrochemical Society 2004, Vol.151 (1), p.C52-C55
Hauptverfasser:	LEE, Young-Hoon, KWAK, Jae-Chan, GANG, Bong-Suck, KIM, Hie-Chul, CHOI, Byung-Ho, JEONG, Bong-Kyo, PARK, Sung-Ho, LEE, Kyuoung-Ho
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
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doi_str_mv	10.1149/1.1629096
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source	Institute of Physics Journals
subjects	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
title	Photo-induced atomic layer deposition of tantalum oxide thin films from Ta(OC2H5)5 and O2
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