The structure and mechanical properties of multilayer TiN/(Ti0.5Al0.5)N coatings deposited by plasma enhanced chemical vapor deposition

Bibliographische Detailangaben

Hauptverfasser:	LEE, Dong-Kak, LEE, Seung-Hoon, LEE, Jung-Joong
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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