Effects of Boron and Germanium Base Profiles on SiGe and SiGe:C BJT Characteristics

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Hauptverfasser: Sadovnikov, A., Printy, C., Budri, T., Loo, R., Meunier-Beillard, P., El-Diwany, M.
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creator Sadovnikov, A.
Printy, C.
Budri, T.
Loo, R.
Meunier-Beillard, P.
El-Diwany, M.
description
doi_str_mv 10.1109/ESSDERC.2002.195005
format Conference Proceeding
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ispartof 32nd European Solid-State Device Research Conference, 2002, p.611-614
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Applied sciences
Boron
Carbon dioxide
Doping profiles
Electronics
Epitaxial growth
Exact sciences and technology
Germanium silicon alloys
Linearity
Radio frequency
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicon germanium
Temperature
Transistors
Tunneling
title Effects of Boron and Germanium Base Profiles on SiGe and SiGe:C BJT Characteristics
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