Patterning of Narrow Au Nanocluster Lines Using V2O5 Nanowire Masks and Ion-Beam Milling

A shadow mask technique employing V2O5 nanowires and ion-beam milling is used to define narrow lines of monolayer-encapsulated Au nanoclusters. When positioned between electrodes these lines are shown to be conducting and to have nonlinear I−V characteristics with nonzero threshold voltages consiste...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Nano letters 2003-02, Vol.3 (2), p.135-138
Hauptverfasser:	Ancona, M. G, Kooi, S. E, Kruppa, W, Snow, A. W, Foos, E. E, Whitman, L. J, Park, D, Shirey, L
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electronics Exact sciences and technology Molecular electronics, nanoelectronics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!