Diffusion in porous silicon: effects on the reactivity of alkenes and electrochemistry of alkylated porous silicon: Surface modification of semiconductors
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Veröffentlicht in: | Electrochimica acta 2002, Vol.47 (16), p.2653-2663 |
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creator | DE SMET, Louis C. P. M ZUILHOF, Han SUDHÖLTER, Ernst J. R WITTSTOCK, Gunther DUERDIN, Mark S LIE, Lars H HOULTON, Andrew HORROCKS, Benjamin R |
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fullrecord | <record><control><sourceid>pascalfrancis</sourceid><recordid>TN_cdi_pascalfrancis_primary_13725160</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>13725160</sourcerecordid><originalsourceid>FETCH-pascalfrancis_primary_137251603</originalsourceid><addsrcrecordid>eNqNjD1PwzAQQK0KpAbKf7iFMZJTkw-6QhE_gL06OWflimNHPqdS_j0Z2qUT0xve09uooupaU5qufn9QhdaVKd-artmqJ5Gz1rptWl2o9MnOzcIxAAeYYoqzgLBnG8MByDmyWWC1eSBIhDbzhfMC0QH6XwokgKEH8muXoh1oZMnp5hePmfq77U49OvRCL1c-q9ev48_HdzmhWPQuYbAspynxiGk5Vabd11WjzX-7P4igT-A</addsrcrecordid><sourcetype>Index Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Diffusion in porous silicon: effects on the reactivity of alkenes and electrochemistry of alkylated porous silicon: Surface modification of semiconductors</title><source>Elsevier ScienceDirect Journals</source><creator>DE SMET, Louis C. P. M ; ZUILHOF, Han ; SUDHÖLTER, Ernst J. R ; WITTSTOCK, Gunther ; DUERDIN, Mark S ; LIE, Lars H ; HOULTON, Andrew ; HORROCKS, Benjamin R</creator><creatorcontrib>DE SMET, Louis C. P. M ; ZUILHOF, Han ; SUDHÖLTER, Ernst J. R ; WITTSTOCK, Gunther ; DUERDIN, Mark S ; LIE, Lars H ; HOULTON, Andrew ; HORROCKS, Benjamin R</creatorcontrib><identifier>ISSN: 0013-4686</identifier><identifier>EISSN: 1873-3859</identifier><identifier>CODEN: ELCAAV</identifier><language>eng</language><publisher>Oxford: Elsevier</publisher><subject>Chemistry ; Electrochemistry ; Exact sciences and technology ; General and physical chemistry ; Study of interfaces ; Transport phenomena</subject><ispartof>Electrochimica acta, 2002, Vol.47 (16), p.2653-2663</ispartof><rights>2002 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,4009</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=13725160$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>DE SMET, Louis C. P. M</creatorcontrib><creatorcontrib>ZUILHOF, Han</creatorcontrib><creatorcontrib>SUDHÖLTER, Ernst J. R</creatorcontrib><creatorcontrib>WITTSTOCK, Gunther</creatorcontrib><creatorcontrib>DUERDIN, Mark S</creatorcontrib><creatorcontrib>LIE, Lars H</creatorcontrib><creatorcontrib>HOULTON, Andrew</creatorcontrib><creatorcontrib>HORROCKS, Benjamin R</creatorcontrib><title>Diffusion in porous silicon: effects on the reactivity of alkenes and electrochemistry of alkylated porous silicon: Surface modification of semiconductors</title><title>Electrochimica acta</title><subject>Chemistry</subject><subject>Electrochemistry</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Study of interfaces</subject><subject>Transport phenomena</subject><issn>0013-4686</issn><issn>1873-3859</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNqNjD1PwzAQQK0KpAbKf7iFMZJTkw-6QhE_gL06OWflimNHPqdS_j0Z2qUT0xve09uooupaU5qufn9QhdaVKd-artmqJ5Gz1rptWl2o9MnOzcIxAAeYYoqzgLBnG8MByDmyWWC1eSBIhDbzhfMC0QH6XwokgKEH8muXoh1oZMnp5hePmfq77U49OvRCL1c-q9ev48_HdzmhWPQuYbAspynxiGk5Vabd11WjzX-7P4igT-A</recordid><startdate>2002</startdate><enddate>2002</enddate><creator>DE SMET, Louis C. P. M</creator><creator>ZUILHOF, Han</creator><creator>SUDHÖLTER, Ernst J. R</creator><creator>WITTSTOCK, Gunther</creator><creator>DUERDIN, Mark S</creator><creator>LIE, Lars H</creator><creator>HOULTON, Andrew</creator><creator>HORROCKS, Benjamin R</creator><general>Elsevier</general><scope>IQODW</scope></search><sort><creationdate>2002</creationdate><title>Diffusion in porous silicon: effects on the reactivity of alkenes and electrochemistry of alkylated porous silicon</title><author>DE SMET, Louis C. P. M ; ZUILHOF, Han ; SUDHÖLTER, Ernst J. R ; WITTSTOCK, Gunther ; DUERDIN, Mark S ; LIE, Lars H ; HOULTON, Andrew ; HORROCKS, Benjamin R</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-pascalfrancis_primary_137251603</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><topic>Chemistry</topic><topic>Electrochemistry</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Study of interfaces</topic><topic>Transport phenomena</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>DE SMET, Louis C. P. M</creatorcontrib><creatorcontrib>ZUILHOF, Han</creatorcontrib><creatorcontrib>SUDHÖLTER, Ernst J. R</creatorcontrib><creatorcontrib>WITTSTOCK, Gunther</creatorcontrib><creatorcontrib>DUERDIN, Mark S</creatorcontrib><creatorcontrib>LIE, Lars H</creatorcontrib><creatorcontrib>HOULTON, Andrew</creatorcontrib><creatorcontrib>HORROCKS, Benjamin R</creatorcontrib><collection>Pascal-Francis</collection><jtitle>Electrochimica acta</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>DE SMET, Louis C. P. M</au><au>ZUILHOF, Han</au><au>SUDHÖLTER, Ernst J. R</au><au>WITTSTOCK, Gunther</au><au>DUERDIN, Mark S</au><au>LIE, Lars H</au><au>HOULTON, Andrew</au><au>HORROCKS, Benjamin R</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Diffusion in porous silicon: effects on the reactivity of alkenes and electrochemistry of alkylated porous silicon: Surface modification of semiconductors</atitle><jtitle>Electrochimica acta</jtitle><date>2002</date><risdate>2002</risdate><volume>47</volume><issue>16</issue><spage>2653</spage><epage>2663</epage><pages>2653-2663</pages><issn>0013-4686</issn><eissn>1873-3859</eissn><coden>ELCAAV</coden><cop>Oxford</cop><pub>Elsevier</pub></addata></record> |
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identifier | ISSN: 0013-4686 |
ispartof | Electrochimica acta, 2002, Vol.47 (16), p.2653-2663 |
issn | 0013-4686 1873-3859 |
language | eng |
recordid | cdi_pascalfrancis_primary_13725160 |
source | Elsevier ScienceDirect Journals |
subjects | Chemistry Electrochemistry Exact sciences and technology General and physical chemistry Study of interfaces Transport phenomena |
title | Diffusion in porous silicon: effects on the reactivity of alkenes and electrochemistry of alkylated porous silicon: Surface modification of semiconductors |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T00%3A52%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Diffusion%20in%20porous%20silicon:%20effects%20on%20the%20reactivity%20of%20alkenes%20and%20electrochemistry%20of%20alkylated%20porous%20silicon:%20Surface%20modification%20of%20semiconductors&rft.jtitle=Electrochimica%20acta&rft.au=DE%20SMET,%20Louis%20C.%20P.%20M&rft.date=2002&rft.volume=47&rft.issue=16&rft.spage=2653&rft.epage=2663&rft.pages=2653-2663&rft.issn=0013-4686&rft.eissn=1873-3859&rft.coden=ELCAAV&rft_id=info:doi/&rft_dat=%3Cpascalfrancis%3E13725160%3C/pascalfrancis%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |