Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration

An approach for high-throughput rapid screening of chemical vapor deposition (CVD) materials using micromachined silicon microheater arrays is described. To illustrate this approach, titanium dioxide was deposited by CVD, using titanium(IV) nitrate and titanium(IV) isopropoxide at temperatures betwe...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Chemistry of materials 2002-04, Vol.14 (4), p.1671-1677
Hauptverfasser: Taylor, Charles J, Semancik, Steve
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 1677
container_issue 4
container_start_page 1671
container_title Chemistry of materials
container_volume 14
creator Taylor, Charles J
Semancik, Steve
description An approach for high-throughput rapid screening of chemical vapor deposition (CVD) materials using micromachined silicon microheater arrays is described. To illustrate this approach, titanium dioxide was deposited by CVD, using titanium(IV) nitrate and titanium(IV) isopropoxide at temperatures between 130 and 815 °C. Deposition was confined to the microhotplate elements within 4- and 16-element arrays. Film microstructure was examined by scanning electron microscopy. In situ electrical measurements were made with integrated microcontacts during the deposition of TiO2 using titanium(IV) isopropoxide. A novel approach using temperature-programmed deposition with temperature ramp rates up to 800 °C/s was also employed for microstructure modification during deposition. Additionally, the steep temperature gradients present on the microhotplate supports have been demonstrated to provide an excellent platform for investigating temperature-dependent microstructures.
doi_str_mv 10.1021/cm0108583
format Article
fullrecord <record><control><sourceid>acs_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_827530</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>b141086115</sourcerecordid><originalsourceid>FETCH-LOGICAL-a351t-36570be2ddacd2bf1a23df6dc8cd0409a7f1cc5cca53b0c0e22239fe69a4fb8f3</originalsourceid><addsrcrecordid>eNpt0E1PxCAQBmBiNHH9OPgP6sGDh-oAS9s9qlk_EjdqVs-ETiGia2kYTNZ_L5savRgOkJmHIbyMHXE44yD4OX4Ah0Y1cotNuBJQKgCxzSbQzOpyWqtql-0RvQHwzJsJW76QLYIrFh5jeA1pWJlki4sYzRcVhsZ6Z4dAPvnQF8vPllLMhgoXYrHIp-jNior5eliF3MjogO24XLKHP_s-e7meP1_dlvcPN3dXF_elkYqnUlaqhtaKrjPYidZxI2Tnqg4b7GAKM1M7jqgQjZItIFghhJw5W83M1LWNk_vseJwbKHlN6JPFVwx9bzHpRtRKQjano8nfIIrW6SH6DxO_NAe9SUz_JpbtyWgHQ2hWLpoePf1dkFVe040rR-cp2fVv38R3XdWyVvr5canry5vF4-3iWj_9zTVI-i18xj6n8s_73x5sh3A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration</title><source>ACS Publications</source><creator>Taylor, Charles J ; Semancik, Steve</creator><creatorcontrib>Taylor, Charles J ; Semancik, Steve ; National Institute of Standards and Technology, Gaithersburg, MD (US)</creatorcontrib><description>An approach for high-throughput rapid screening of chemical vapor deposition (CVD) materials using micromachined silicon microheater arrays is described. To illustrate this approach, titanium dioxide was deposited by CVD, using titanium(IV) nitrate and titanium(IV) isopropoxide at temperatures between 130 and 815 °C. Deposition was confined to the microhotplate elements within 4- and 16-element arrays. Film microstructure was examined by scanning electron microscopy. In situ electrical measurements were made with integrated microcontacts during the deposition of TiO2 using titanium(IV) isopropoxide. A novel approach using temperature-programmed deposition with temperature ramp rates up to 800 °C/s was also employed for microstructure modification during deposition. Additionally, the steep temperature gradients present on the microhotplate supports have been demonstrated to provide an excellent platform for investigating temperature-dependent microstructures.</description><identifier>ISSN: 0897-4756</identifier><identifier>EISSN: 1520-5002</identifier><identifier>DOI: 10.1021/cm0108583</identifier><language>eng</language><publisher>Washington, DC: American Chemical Society</publisher><subject>CHEMISTRY ; ENVIRONMENTAL SCIENCES ; Exact sciences and technology ; EXPLORATION ; General equipment and techniques ; INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY ; Instruments, apparatus, components and techniques common to several branches of physics and astronomy ; Physics ; Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing ; SUBSTRATES</subject><ispartof>Chemistry of materials, 2002-04, Vol.14 (4), p.1671-1677</ispartof><rights>Copyright © 2002 American Chemical Society</rights><rights>2002 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a351t-36570be2ddacd2bf1a23df6dc8cd0409a7f1cc5cca53b0c0e22239fe69a4fb8f3</citedby><cites>FETCH-LOGICAL-a351t-36570be2ddacd2bf1a23df6dc8cd0409a7f1cc5cca53b0c0e22239fe69a4fb8f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/cm0108583$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/cm0108583$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>230,314,776,780,881,2751,27055,27903,27904,56716,56766</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=13636343$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/827530$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Taylor, Charles J</creatorcontrib><creatorcontrib>Semancik, Steve</creatorcontrib><creatorcontrib>National Institute of Standards and Technology, Gaithersburg, MD (US)</creatorcontrib><title>Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration</title><title>Chemistry of materials</title><addtitle>Chem. Mater</addtitle><description>An approach for high-throughput rapid screening of chemical vapor deposition (CVD) materials using micromachined silicon microheater arrays is described. To illustrate this approach, titanium dioxide was deposited by CVD, using titanium(IV) nitrate and titanium(IV) isopropoxide at temperatures between 130 and 815 °C. Deposition was confined to the microhotplate elements within 4- and 16-element arrays. Film microstructure was examined by scanning electron microscopy. In situ electrical measurements were made with integrated microcontacts during the deposition of TiO2 using titanium(IV) isopropoxide. A novel approach using temperature-programmed deposition with temperature ramp rates up to 800 °C/s was also employed for microstructure modification during deposition. Additionally, the steep temperature gradients present on the microhotplate supports have been demonstrated to provide an excellent platform for investigating temperature-dependent microstructures.</description><subject>CHEMISTRY</subject><subject>ENVIRONMENTAL SCIENCES</subject><subject>Exact sciences and technology</subject><subject>EXPLORATION</subject><subject>General equipment and techniques</subject><subject>INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY</subject><subject>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>Physics</subject><subject>Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing</subject><subject>SUBSTRATES</subject><issn>0897-4756</issn><issn>1520-5002</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNpt0E1PxCAQBmBiNHH9OPgP6sGDh-oAS9s9qlk_EjdqVs-ETiGia2kYTNZ_L5savRgOkJmHIbyMHXE44yD4OX4Ah0Y1cotNuBJQKgCxzSbQzOpyWqtql-0RvQHwzJsJW76QLYIrFh5jeA1pWJlki4sYzRcVhsZ6Z4dAPvnQF8vPllLMhgoXYrHIp-jNior5eliF3MjogO24XLKHP_s-e7meP1_dlvcPN3dXF_elkYqnUlaqhtaKrjPYidZxI2Tnqg4b7GAKM1M7jqgQjZItIFghhJw5W83M1LWNk_vseJwbKHlN6JPFVwx9bzHpRtRKQjano8nfIIrW6SH6DxO_NAe9SUz_JpbtyWgHQ2hWLpoePf1dkFVe040rR-cp2fVv38R3XdWyVvr5canry5vF4-3iWj_9zTVI-i18xj6n8s_73x5sh3A</recordid><startdate>20020401</startdate><enddate>20020401</enddate><creator>Taylor, Charles J</creator><creator>Semancik, Steve</creator><general>American Chemical Society</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20020401</creationdate><title>Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration</title><author>Taylor, Charles J ; Semancik, Steve</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a351t-36570be2ddacd2bf1a23df6dc8cd0409a7f1cc5cca53b0c0e22239fe69a4fb8f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><topic>CHEMISTRY</topic><topic>ENVIRONMENTAL SCIENCES</topic><topic>Exact sciences and technology</topic><topic>EXPLORATION</topic><topic>General equipment and techniques</topic><topic>INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY</topic><topic>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</topic><topic>Physics</topic><topic>Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing</topic><topic>SUBSTRATES</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Taylor, Charles J</creatorcontrib><creatorcontrib>Semancik, Steve</creatorcontrib><creatorcontrib>National Institute of Standards and Technology, Gaithersburg, MD (US)</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Chemistry of materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Taylor, Charles J</au><au>Semancik, Steve</au><aucorp>National Institute of Standards and Technology, Gaithersburg, MD (US)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration</atitle><jtitle>Chemistry of materials</jtitle><addtitle>Chem. Mater</addtitle><date>2002-04-01</date><risdate>2002</risdate><volume>14</volume><issue>4</issue><spage>1671</spage><epage>1677</epage><pages>1671-1677</pages><issn>0897-4756</issn><eissn>1520-5002</eissn><abstract>An approach for high-throughput rapid screening of chemical vapor deposition (CVD) materials using micromachined silicon microheater arrays is described. To illustrate this approach, titanium dioxide was deposited by CVD, using titanium(IV) nitrate and titanium(IV) isopropoxide at temperatures between 130 and 815 °C. Deposition was confined to the microhotplate elements within 4- and 16-element arrays. Film microstructure was examined by scanning electron microscopy. In situ electrical measurements were made with integrated microcontacts during the deposition of TiO2 using titanium(IV) isopropoxide. A novel approach using temperature-programmed deposition with temperature ramp rates up to 800 °C/s was also employed for microstructure modification during deposition. Additionally, the steep temperature gradients present on the microhotplate supports have been demonstrated to provide an excellent platform for investigating temperature-dependent microstructures.</abstract><cop>Washington, DC</cop><pub>American Chemical Society</pub><doi>10.1021/cm0108583</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0897-4756
ispartof Chemistry of materials, 2002-04, Vol.14 (4), p.1671-1677
issn 0897-4756
1520-5002
language eng
recordid cdi_osti_scitechconnect_827530
source ACS Publications
subjects CHEMISTRY
ENVIRONMENTAL SCIENCES
Exact sciences and technology
EXPLORATION
General equipment and techniques
INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Physics
Sensors (chemical, optical, electrical, movement, gas, etc.)
remote sensing
SUBSTRATES
title Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-26T07%3A51%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-acs_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Use%20of%20Microhotplate%20Arrays%20as%20Microdeposition%20Substrates%20for%20Materials%20Exploration&rft.jtitle=Chemistry%20of%20materials&rft.au=Taylor,%20Charles%20J&rft.aucorp=National%20Institute%20of%20Standards%20and%20Technology,%20Gaithersburg,%20MD%20(US)&rft.date=2002-04-01&rft.volume=14&rft.issue=4&rft.spage=1671&rft.epage=1677&rft.pages=1671-1677&rft.issn=0897-4756&rft.eissn=1520-5002&rft_id=info:doi/10.1021/cm0108583&rft_dat=%3Cacs_osti_%3Eb141086115%3C/acs_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true