Wet chemical etching of high-temperature superconducting Y-Ba-Cu-O films in ethylenediaminetetraacetic acid
A new wet chemical etchant for high-temperature superconducting films is reported, which leaves transition temperature unaffected within experimental accuracy (1 K) and does not require reoxygenation. The solution consists of ethylenediaminetetraacetic acid (EDTA) in water, and is suitable for micro...
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| Veröffentlicht in: | Applied physics letters 1989-12, Vol.55 (25), p.2661-2663 |
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| container_issue | 25 |
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| container_title | Applied physics letters |
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| creator | SHOKOOHI, F. K SCHIAVONE, L. M ROGERS, C. T INAM, A WU, X. D NAZAR, L VENKATESAN, T |
| description | A new wet chemical etchant for high-temperature superconducting films is reported, which leaves transition temperature unaffected within experimental accuracy (1 K) and does not require reoxygenation. The solution consists of ethylenediaminetetraacetic acid (EDTA) in water, and is suitable for micropatterning using standard photolithography. We have fabricated 3–50 μm patterns on laser-deposited Y-Ba-Cu-O films. The bulk of the films etches at 0.14 μm/min in a saturated solution at room temperature. Porous surface layers are removed three times faster than the dense portions of the films. Etch rate depends linearly on the solution concentration and exponentially on the solution temperature. These rates are reduced if etching is interrupted and the samples are exposed to atmosphere. |
| doi_str_mv | 10.1063/1.102366 |
| format | Article |
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These rates are reduced if etching is interrupted and the samples are exposed to atmosphere.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.102366</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>Melville, NY: American Institute of Physics</publisher><subject>360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication ; ACETIC ACID ; ALKALINE EARTH METAL COMPOUNDS ; Applied sciences ; BARIUM COMPOUNDS ; BARIUM OXIDES ; CARBOXYLIC ACIDS ; CHALCOGENIDES ; COPPER COMPOUNDS ; COPPER OXIDES ; Electronics ; ETCHING ; Exact sciences and technology ; LAYERS ; MATERIALS SCIENCE ; Microelectronic fabrication (materials and surfaces technology) ; MONOCARBOXYLIC ACIDS ; ORGANIC ACIDS ; ORGANIC COMPOUNDS ; OXIDES ; OXYGEN COMPOUNDS ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; SUPERCONDUCTING FILMS ; SURFACE FINISHING ; TRANSITION ELEMENT COMPOUNDS ; YTTRIUM COMPOUNDS ; YTTRIUM OXIDES</subject><ispartof>Applied physics letters, 1989-12, Vol.55 (25), p.2661-2663</ispartof><rights>1991 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c412t-7a847965dde34edfac5e79b428721babb393b07eef7ce91a18e20dbf7ef5b9d73</citedby><cites>FETCH-LOGICAL-c412t-7a847965dde34edfac5e79b428721babb393b07eef7ce91a18e20dbf7ef5b9d73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,777,781,882,27905,27906</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19720561$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/7167992$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>SHOKOOHI, F. K</creatorcontrib><creatorcontrib>SCHIAVONE, L. M</creatorcontrib><creatorcontrib>ROGERS, C. T</creatorcontrib><creatorcontrib>INAM, A</creatorcontrib><creatorcontrib>WU, X. D</creatorcontrib><creatorcontrib>NAZAR, L</creatorcontrib><creatorcontrib>VENKATESAN, T</creatorcontrib><title>Wet chemical etching of high-temperature superconducting Y-Ba-Cu-O films in ethylenediaminetetraacetic acid</title><title>Applied physics letters</title><description>A new wet chemical etchant for high-temperature superconducting films is reported, which leaves transition temperature unaffected within experimental accuracy (1 K) and does not require reoxygenation. The solution consists of ethylenediaminetetraacetic acid (EDTA) in water, and is suitable for micropatterning using standard photolithography. We have fabricated 3–50 μm patterns on laser-deposited Y-Ba-Cu-O films. The bulk of the films etches at 0.14 μm/min in a saturated solution at room temperature. Porous surface layers are removed three times faster than the dense portions of the films. Etch rate depends linearly on the solution concentration and exponentially on the solution temperature. These rates are reduced if etching is interrupted and the samples are exposed to atmosphere.</description><subject>360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication</subject><subject>ACETIC ACID</subject><subject>ALKALINE EARTH METAL COMPOUNDS</subject><subject>Applied sciences</subject><subject>BARIUM COMPOUNDS</subject><subject>BARIUM OXIDES</subject><subject>CARBOXYLIC ACIDS</subject><subject>CHALCOGENIDES</subject><subject>COPPER COMPOUNDS</subject><subject>COPPER OXIDES</subject><subject>Electronics</subject><subject>ETCHING</subject><subject>Exact sciences and technology</subject><subject>LAYERS</subject><subject>MATERIALS SCIENCE</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>MONOCARBOXYLIC ACIDS</subject><subject>ORGANIC ACIDS</subject><subject>ORGANIC COMPOUNDS</subject><subject>OXIDES</subject><subject>OXYGEN COMPOUNDS</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>SUPERCONDUCTING FILMS</subject><subject>SURFACE FINISHING</subject><subject>TRANSITION ELEMENT COMPOUNDS</subject><subject>YTTRIUM COMPOUNDS</subject><subject>YTTRIUM OXIDES</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1989</creationdate><recordtype>article</recordtype><recordid>eNqN0UtLJDEQB_CwuLDjA_YjNILiJZrHpNM56qC7guBlRTyFdHXFjvZjTNIHv_1GRvDqqVLwy5-iipDfnJ1zVssLXoqQdf2DrDjTmkrOmz2yYoxJWhvFf5H9lF5Kq4SUK_L6iLmCHscAbqgwQx-m52r2VR-ee5px3GJ0eYlYpaU8YZ66BfKHeaJXjm4Wel_5MIypClP53r8POGEX3BgmzJijc4A5QOUgdIfkp3dDwqPPekAebq7_bf7Su_s_t5vLOwprLjLVrllrU6uuQ7nGzjtQqE27Fo0WvHVtK41smUb0GtBwxxsUrGu9Rq9a02l5QI53uXPKwSYIGaEvk08I2Wpea2NEQac7tI3z24Ip2zEkwGFwE85LskIp1SjBvwdLaIFnOwhxTimit9sYRhffLWf24zaW291tCj35zHSp7N1HN0FIX95owVTN5X9zBI7N</recordid><startdate>19891218</startdate><enddate>19891218</enddate><creator>SHOKOOHI, F. K</creator><creator>SCHIAVONE, L. M</creator><creator>ROGERS, C. 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D ; NAZAR, L ; VENKATESAN, T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c412t-7a847965dde34edfac5e79b428721babb393b07eef7ce91a18e20dbf7ef5b9d73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1989</creationdate><topic>360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication</topic><topic>ACETIC ACID</topic><topic>ALKALINE EARTH METAL COMPOUNDS</topic><topic>Applied sciences</topic><topic>BARIUM COMPOUNDS</topic><topic>BARIUM OXIDES</topic><topic>CARBOXYLIC ACIDS</topic><topic>CHALCOGENIDES</topic><topic>COPPER COMPOUNDS</topic><topic>COPPER OXIDES</topic><topic>Electronics</topic><topic>ETCHING</topic><topic>Exact sciences and technology</topic><topic>LAYERS</topic><topic>MATERIALS SCIENCE</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>MONOCARBOXYLIC ACIDS</topic><topic>ORGANIC ACIDS</topic><topic>ORGANIC COMPOUNDS</topic><topic>OXIDES</topic><topic>OXYGEN COMPOUNDS</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>SUPERCONDUCTING FILMS</topic><topic>SURFACE FINISHING</topic><topic>TRANSITION ELEMENT COMPOUNDS</topic><topic>YTTRIUM COMPOUNDS</topic><topic>YTTRIUM OXIDES</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>SHOKOOHI, F. K</creatorcontrib><creatorcontrib>SCHIAVONE, L. M</creatorcontrib><creatorcontrib>ROGERS, C. T</creatorcontrib><creatorcontrib>INAM, A</creatorcontrib><creatorcontrib>WU, X. D</creatorcontrib><creatorcontrib>NAZAR, L</creatorcontrib><creatorcontrib>VENKATESAN, T</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>SHOKOOHI, F. K</au><au>SCHIAVONE, L. M</au><au>ROGERS, C. T</au><au>INAM, A</au><au>WU, X. D</au><au>NAZAR, L</au><au>VENKATESAN, T</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Wet chemical etching of high-temperature superconducting Y-Ba-Cu-O films in ethylenediaminetetraacetic acid</atitle><jtitle>Applied physics letters</jtitle><date>1989-12-18</date><risdate>1989</risdate><volume>55</volume><issue>25</issue><spage>2661</spage><epage>2663</epage><pages>2661-2663</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>A new wet chemical etchant for high-temperature superconducting films is reported, which leaves transition temperature unaffected within experimental accuracy (1 K) and does not require reoxygenation. The solution consists of ethylenediaminetetraacetic acid (EDTA) in water, and is suitable for micropatterning using standard photolithography. We have fabricated 3–50 μm patterns on laser-deposited Y-Ba-Cu-O films. The bulk of the films etches at 0.14 μm/min in a saturated solution at room temperature. Porous surface layers are removed three times faster than the dense portions of the films. Etch rate depends linearly on the solution concentration and exponentially on the solution temperature. These rates are reduced if etching is interrupted and the samples are exposed to atmosphere.</abstract><cop>Melville, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.102366</doi><tpages>3</tpages></addata></record> |
| fulltext | fulltext |
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| ispartof | Applied physics letters, 1989-12, Vol.55 (25), p.2661-2663 |
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| language | eng |
| recordid | cdi_osti_scitechconnect_7167992 |
| source | AIP Digital Archive |
| subjects | 360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication ACETIC ACID ALKALINE EARTH METAL COMPOUNDS Applied sciences BARIUM COMPOUNDS BARIUM OXIDES CARBOXYLIC ACIDS CHALCOGENIDES COPPER COMPOUNDS COPPER OXIDES Electronics ETCHING Exact sciences and technology LAYERS MATERIALS SCIENCE Microelectronic fabrication (materials and surfaces technology) MONOCARBOXYLIC ACIDS ORGANIC ACIDS ORGANIC COMPOUNDS OXIDES OXYGEN COMPOUNDS Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices SUPERCONDUCTING FILMS SURFACE FINISHING TRANSITION ELEMENT COMPOUNDS YTTRIUM COMPOUNDS YTTRIUM OXIDES |
| title | Wet chemical etching of high-temperature superconducting Y-Ba-Cu-O films in ethylenediaminetetraacetic acid |
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