X-ray spectromicroscopy with a zone plate generated microprobe
The scanning photoelectron microscope at the National Synchrotron Light Source (NSLS) has recently recorded micrographs with a resolution below half a micron. To demonstrate elemental and chemical sensitivity at the submicron level, an artificial structure consisting of Al and SiO2 lines on a boron-...
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| Veröffentlicht in: | Applied physics letters 1990-05, Vol.56 (19), p.1841-1843 |
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| container_end_page | 1843 |
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| container_issue | 19 |
| container_start_page | 1841 |
| container_title | Applied physics letters |
| container_volume | 56 |
| creator | Ade, Harald Kirz, Janos Hulbert, Steven L. Johnson, Erik D. Anderson, Erik Kern, Dieter |
| description | The scanning photoelectron microscope at the National Synchrotron Light Source (NSLS) has recently recorded micrographs with a resolution below half a micron. To demonstrate elemental and chemical sensitivity at the submicron level, an artificial structure consisting of Al and SiO2 lines on a boron-doped silicon substrate was examined. Al 2p and Si 2p primary photoelectrons as well as O KVV Auger electrons were used for image formation. Contrast reversal between the the Si and SiO2 areas was observed in images formed from Si 2p and oxide-shifted Si 2p photoelectrons. The soft x-ray undulator at the NSLS provides coherent illumination of a zone plate to produce the microprobe. The sample is mechanically scanned through the beam allowing the formation of images from photoelectrons detected by a single-pass cylindrical mirror analyzer, or a more complete spectroscopic examination of a selected area of the sample. |
| doi_str_mv | 10.1063/1.103064 |
| format | Article |
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To demonstrate elemental and chemical sensitivity at the submicron level, an artificial structure consisting of Al and SiO2 lines on a boron-doped silicon substrate was examined. Al 2p and Si 2p primary photoelectrons as well as O KVV Auger electrons were used for image formation. Contrast reversal between the the Si and SiO2 areas was observed in images formed from Si 2p and oxide-shifted Si 2p photoelectrons. The soft x-ray undulator at the NSLS provides coherent illumination of a zone plate to produce the microprobe. 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To demonstrate elemental and chemical sensitivity at the submicron level, an artificial structure consisting of Al and SiO2 lines on a boron-doped silicon substrate was examined. Al 2p and Si 2p primary photoelectrons as well as O KVV Auger electrons were used for image formation. Contrast reversal between the the Si and SiO2 areas was observed in images formed from Si 2p and oxide-shifted Si 2p photoelectrons. The soft x-ray undulator at the NSLS provides coherent illumination of a zone plate to produce the microprobe. The sample is mechanically scanned through the beam allowing the formation of images from photoelectrons detected by a single-pass cylindrical mirror analyzer, or a more complete spectroscopic examination of a selected area of the sample.</abstract><cop>United States</cop><doi>10.1063/1.103064</doi><tpages>3</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0003-6951 |
| ispartof | Applied physics letters, 1990-05, Vol.56 (19), p.1841-1843 |
| issn | 0003-6951 1077-3118 |
| language | eng |
| recordid | cdi_osti_scitechconnect_7141861 |
| source | AIP Digital Archive |
| subjects | 440800 -- Miscellaneous Instrumentation-- (1990-) ACCELERATORS ALUMINIUM CHALCOGENIDES CYCLIC ACCELERATORS ELECTRICAL EQUIPMENT ELECTROMAGNETS ELECTRON MICROSCOPES ELECTRON MICROSCOPY ELECTRON SPECTROSCOPY ELEMENTS MAGNETS METALS MICROSCOPES MICROSCOPY MINERALS NSLS OTHER INSTRUMENTATION OXIDE MINERALS OXIDES OXYGEN COMPOUNDS PHOTOELECTRON SPECTROSCOPY RADIATION SOURCES RESOLUTION SCANNING ELECTRON MICROSCOPY SILICA SILICON COMPOUNDS SILICON OXIDES SPATIAL RESOLUTION SPECTROSCOPY SYNCHROTRON RADIATION SOURCES SYNCHROTRONS 440600 -- Optical Instrumentation-- (1990-) WIGGLER MAGNETS X-RAY EQUIPMENT |
| title | X-ray spectromicroscopy with a zone plate generated microprobe |
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